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Results: 1-7 |
Results: 7

Authors: Malkomes, N Szyszka, B
Citation: N. Malkomes et B. Szyszka, Nonclassical impedance control of the high rate midfrequency reactive magnetron sputter process using harmonic analysis, J VAC SCI A, 19(5), 2001, pp. 2368-2372

Authors: Malkomes, N Vergohl, M Szyszka, B
Citation: N. Malkomes et al., Properties of aluminum-doped zinc oxide films deposited by high rate mid-frequency reactive magnetron sputtering, J VAC SCI A, 19(2), 2001, pp. 414-419

Authors: Hunsche, B Vergohl, M Neuhauser, H Klose, F Szyszka, B Matthee, T
Citation: B. Hunsche et al., Effect of deposition parameters on optical and mechanical properties of MF- and DC-sputtered Nb2O5 films, THIN SOL FI, 392(2), 2001, pp. 184-190

Authors: Muller, J Schope, G Kluth, O Rech, B Ruske, M Trube, J Szyszka, B Jiang, X Brauer, G
Citation: J. Muller et al., Upscaling of texture-etched zinc oxide substrates for silicon thin film solar cells, THIN SOL FI, 392(2), 2001, pp. 327-333

Authors: Vergohl, M Malkomes, N Szyszka, B Neumann, F Matthee, T Brauer, G
Citation: M. Vergohl et al., Optimization of the reflectivity of magnetron sputter deposited silver films, J VAC SCI A, 18(4), 2000, pp. 1632-1637

Authors: Vergohl, M Hunsche, B Malkomes, N Matthee, T Szyszka, B
Citation: M. Vergohl et al., Stabilization of high-deposition-rate reactive magnetron sputtering of oxides by in situ spectroscopic ellipsometry and plasma diagnostics, J VAC SCI A, 18(4), 2000, pp. 1709-1712

Authors: Szyszka, B
Citation: B. Szyszka, Transparent and conductive aluminum doped zinc oxide films prepared by mid-frequency reactive magnetron sputtering, THIN SOL FI, 351(1-2), 1999, pp. 164-169
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