Authors:
NAMATSU H
TAKAHASHI Y
YAMAZAKI K
YAMAGUCHI T
NAGASE M
KURIHARA K
Citation: H. Namatsu et al., 3-DIMENSIONAL SILOXANE RESIST FOR THE FORMATION OF NANOPATTERNS WITH MINIMUM LINEWIDTH FLUCTUATIONS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(1), 1998, pp. 69-76