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Results: 1-6 |
Results: 6

Authors: Frisque, G Tejeda, R Engelstad, R Lovell, E
Citation: G. Frisque et al., Modeling pattern transfer in ion-beam lithography masks, MICROEL ENG, 53(1-4), 2000, pp. 623-626

Authors: Ehrmann, A Struck, T Chalupka, A Haugeneder, E Loschner, H Butschke, J Irmscher, M Letzkus, F Springer, R Degen, A Rangelow, IW Shi, F Sossna, E Volland, B Engelstad, R Lovell, E Tejeda, R
Citation: A. Ehrmann et al., Comparison of silicon stencil mask distortion measurements with finite element analysis, J VAC SCI B, 17(6), 1999, pp. 3107-3111

Authors: Engelstad, R Lovell, E Dicks, G Fisher, A Tejeda, R
Citation: R. Engelstad et al., Modeling and simulation of membrane distortions in Next Generation Lithography (NGL) masks, MICROEL ENG, 46(1-4), 1999, pp. 23-26

Authors: Tejeda, R Engelstad, R Lovell, E Haugeneder, E Loschner, H
Citation: R. Tejeda et al., Stress relief structures for ion-beam projection lithography masks, MICROEL ENG, 46(1-4), 1999, pp. 481-484

Authors: Tejeda, R Frisque, G Engelstad, R Lovell, E Haugeneder, E Loschner, H
Citation: R. Tejeda et al., Finite element simulation of ion-beam lithography mask fabrication, MICROEL ENG, 46(1-4), 1999, pp. 485-488

Authors: Rangelow, IW Shi, F Volland, B Sossna, E Petrashenko, A Hudek, P Sunyk, R Butschke, J Letzkus, F Springer, R Ehrmann, A Gross, G Kaesmaier, R Oelmann, A Struck, T Unger, G Chalupka, A Haugeneder, E Lammer, G Loschner, H Tejeda, R Lovell, E Engelstad, R
Citation: Iw. Rangelow et al., p-n junction-based wafer flow process for stencil mask fabrication, J VAC SCI B, 16(6), 1998, pp. 3592-3598
Risultati: 1-6 |