Authors: Tully, DC Frechet, JMJ

Citation: Dc. Tully et Jmj. Frechet, Dendrimers at surfaces and interfaces: chemistry and applications, CHEM COMMUN, (14), 2001, pp. 1229-1239

Authors: Tully, DC Trimble, AR Frechet, JMJ

Citation: Dc. Tully et al., Dendrimers with thermally labile end groups: An alternative approach to chemically amplified resist materials designed for sub-100 nm lithography, ADVAN MATER, 12(15), 2000, pp. 1118

Authors: Tully, DC Wilder, K Frechet, JMJ Trimble, AR Quate, CF

Citation: Dc. Tully et al., Dendrimer-based self-assembled monolayers as resists for scanning probe lithography, ADVAN MATER, 11(4), 1999, pp. 314-318

Authors: Tully, DC Trimble, AR Frechet, JMJ Wilder, K Quate, CF

Citation: Dc. Tully et al., Synthesis and preparation of ionically bound dendrimer monolayers and application toward scanning probe lithography, CHEM MATER, 11(10), 1999, pp. 2892-2898