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Results: 1-8 |
Results: 8
FABRICATION AND ANALYSIS OF EXTREME-ULTRAVIOLET REFLECTION MASKS WITHPATTERNED W C ABSORBER BILAYERS/
Authors: VOORMA HJ LOUIS E KOSTER NB BIJKERK F ZIJLSTRA T DEGROOT LEM ROUSSEEUW BAC ROMIJN J VANDERDRIFT EWJM FRIEDRICH J
Citation: Hj. Voorma et al., FABRICATION AND ANALYSIS OF EXTREME-ULTRAVIOLET REFLECTION MASKS WITHPATTERNED W C ABSORBER BILAYERS/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(2), 1997, pp. 293-298
PREPARATION OF NANOMETER-SCALE WINDOWS IN SIO2 FOR SELECTIVE EPITAXIAL-GROWTH OF SI BASED DEVICES
Authors: MAES JWH LUKEY PW ZIJLSTRA T VISSER C CARO J VANDERDRIFT EWJM TICHELAAR FD RADELAAR S
Citation: Jwh. Maes et al., PREPARATION OF NANOMETER-SCALE WINDOWS IN SIO2 FOR SELECTIVE EPITAXIAL-GROWTH OF SI BASED DEVICES, Microelectronic engineering, 35(1-4), 1997, pp. 321-324
NOVEL POSTETCHING TREATMENT OF SMALL WINDOWS IN OXIDE FOR SELECTIVE EPITAXIAL-GROWTH
Authors: MAES JWH CARO J VISSER CCG ZIJLSTRA T VANDERDRIFT EWJM RADELAAR S TICHELAAR FD FAKKELDIJ EJM
Citation: Jwh. Maes et al., NOVEL POSTETCHING TREATMENT OF SMALL WINDOWS IN OXIDE FOR SELECTIVE EPITAXIAL-GROWTH, Applied physics letters, 70(8), 1997, pp. 973-975
EXTREME UV LITHOGRAPHY - A NEW LASER-PLASMA TARGET CONCEPT AND FABRICATION OF MULTILAYER REFLECTION MASKS
Authors: BIJKERK F SHMAENOK LA LOUIS E VOORMA HJ KOSTER NB BRUINEMAN C BASTIAENSEN RKFJ VANDERDRIFT EWJM ROMIJN J DEGROOT LEM ROUSSEEUW BAC ZIJLSTRA T PLATONOV YY SALASHCHENKO NN
Citation: F. Bijkerk et al., EXTREME UV LITHOGRAPHY - A NEW LASER-PLASMA TARGET CONCEPT AND FABRICATION OF MULTILAYER REFLECTION MASKS, Microelectronic engineering, 30(1-4), 1996, pp. 183-186
SYNTHESIS OF SILOXANES CONTAINING ACID-SENSITIVE SIDE-GROUPS
Authors: PUYENBROEK R JANSEMA JJ VANDEGRAMPEL JC ROUSSEEUW BAC VANDERDRIFT EWJM
Citation: R. Puyenbroek et al., SYNTHESIS OF SILOXANES CONTAINING ACID-SENSITIVE SIDE-GROUPS, Polymer, 37(5), 1996, pp. 847-854
THE APPLICATION OF PHOSPHAZENE CONTAINING POLYMERS AS NEGATIVE RESISTS IN MICROLITHOGRAPHY
Authors: PUYENBROEK R BOSSCHER G VANDEGRAMPEL JC ROUSSEEUW BAC VANDERDRIFT EWJM
Citation: R. Puyenbroek et al., THE APPLICATION OF PHOSPHAZENE CONTAINING POLYMERS AS NEGATIVE RESISTS IN MICROLITHOGRAPHY, Phosphorus, sulfur and silicon and the related elements, 93(1-4), 1994, pp. 277-280
FUNCTIONALIZATION OF POLYSILSESQUIOXANES
Authors: PUYENBROEK R VANDEGRAMPEL JC ROUSSEEUW BAC VANDERDRIFT EWJM
Citation: R. Puyenbroek et al., FUNCTIONALIZATION OF POLYSILSESQUIOXANES, Polymer, 35(14), 1994, pp. 3131-3132
SOFT-X-RAY PROJECTION LITHOGRAPHY USING A HIGH-REPETITION-RATE LASER-INDUCED X-RAY SOURCE FOR SUB-100 NANOMETER LITHOGRAPHY PROCESSES
Authors: LOUIS E BIJKERK F SHMAENOK L VOORMA HJ VANDERWIEL MJ SCHLATMANN R VERHOEVEN J VANDERDRIFT EWJM ROMIJN J ROUSSEEUW BAC VOSS F DESOR R NIKOLAUS B
Citation: E. Louis et al., SOFT-X-RAY PROJECTION LITHOGRAPHY USING A HIGH-REPETITION-RATE LASER-INDUCED X-RAY SOURCE FOR SUB-100 NANOMETER LITHOGRAPHY PROCESSES, Microelectronic engineering, 21(1-4), 1993, pp. 67-70
Risultati: 1-8 |