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Results: 1-16 |
Results: 16

Authors: MCNEELY P BOILSON D CURRAN N HOPKINS M VENDER D
Citation: P. Mcneely et al., RECOMMISSIONING THE DEUTERIUM NEGATIVE-ION SOURCE EXPERIMENT ION-SOURCE FOR STUDIES IN SUPPORT OF IGNITION DEVICE TO TEST ENGINEERING CONCEPTS, Review of scientific instruments, 69(2), 1998, pp. 983-985

Authors: SADEGHI N VANDEGRIFT M VENDER D KROESEN GMW DEHOOG FJ
Citation: N. Sadeghi et al., TRANSPORT OF ARGON IONS IN AN INDUCTIVELY-COUPLED HIGH-DENSITY PLASMAREACTOR, Applied physics letters, 70(7), 1997, pp. 835-837

Authors: VENDER D SMITH HB BOSWELL RW
Citation: D. Vender et al., SIMULATIONS OF MULTIPACTOR-ASSISTED BREAKDOWN IN RADIO-FREQUENCY PLASMAS, Journal of applied physics, 80(8), 1996, pp. 4292-4298

Authors: VENDER D KROESEN GMW DEHOOG FJ
Citation: D. Vender et al., SIGNATURES OF THE BOHM AND SHEATH VELOCITIES IN MINORITY-LIGHT-ION ENERGY-DISTRIBUTIONS, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics, 51(4), 1995, pp. 3480-3483

Authors: STOFFELS E STOFFELS WW VENDER D KANDO M KROESEN GMW DEHOOG FJ
Citation: E. Stoffels et al., NEGATIVE-IONS IN A RADIOFREQUENCY OXYGEN PLASMA, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics, 51(3), 1995, pp. 2425-2435

Authors: VENDER D STOFFELS WW STOFFELS E KROESEN GMW DEHOOG FJ
Citation: D. Vender et al., CHARGED-SPECIES PROFILES IN ELECTRONEGATIVE RADIOFREQUENCY PLASMAS, Physical review. E, Statistical physics, plasmas, fluids, and related interdisciplinary topics, 51(3), 1995, pp. 2436-2444

Authors: BOSWELL RW VENDER D
Citation: Rw. Boswell et D. Vender, AN EXPERIMENTAL-STUDY OF BREAKDOWN IN A PULSED HELICON PLASMA, Plasma sources science & technology, 4(4), 1995, pp. 534-540

Authors: STOFFELS E STOFFELS WW VENDER D HAVERLAG M KROESEN GMW DEHOOG FJ
Citation: E. Stoffels et al., NEGATIVE-IONS IN LOW-PRESSURE DISCHARGES, Contributions to Plasma Physics, 35(4-5), 1995, pp. 331-357

Authors: STOFFELS E STOFFELS WW VENDER D KROESEN GMW DEHOOG FJ
Citation: E. Stoffels et al., NEGATIVE-IONS IN A CCL2F2 RADIO-FREQUENCY DISCHARGE, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(4), 1995, pp. 2051-2057

Authors: KERSTEN H STEFFEN H VENDER D WAGNER HE
Citation: H. Kersten et al., ON THE ION ENERGY-TRANSFER TO THE SUBSTRATE DURING TITANIUM DEPOSITION IN A HOLLOW CATHODE ARC-DISCHARGE, Vacuum, 46(3), 1995, pp. 305-308

Authors: HAVERLAG M OEHRLEIN GS VENDER D
Citation: M. Haverlag et al., SIDEWALL PASSIVATION DURING THE ETCHING OF POLY-SI IN AN ELECTRON-CYCLOTRON-RESONANCE PLASMA OF HBR, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(1), 1994, pp. 96-101

Authors: BELL FH JOUBERT O OEHRLEIN GS ZHANG Y VENDER D
Citation: Fh. Bell et al., INVESTIGATION OF SELECTIVE SIO2-TO-SI ETCHING IN AN INDUCTIVELY-COUPLED HIGH-DENSITY PLASMA USING FLUOROCARBON GASES, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(6), 1994, pp. 3095-3101

Authors: OEHRLEIN GS ZHANG Y VENDER D HAVERLAG M
Citation: Gs. Oehrlein et al., FLUOROCARBON HIGH-DENSITY PLASMAS .1. FLUOROCARBON FILM DEPOSITION AND ETCHING USING CF4 AND CHF3, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(2), 1994, pp. 323-332

Authors: OEHRLEIN GS ZHANG Y VENDER D JOUBERT O
Citation: Gs. Oehrlein et al., FLUOROCARBON HIGH-DENSITY PLASMAS .2. SILICON DIOXIDE AND SILICON ETCHING USING CF4 AND CHF3, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(2), 1994, pp. 333-344

Authors: STOFFELS E STOFFELS WW VENDER D KROESEN GMW DEHOOG FJ
Citation: E. Stoffels et al., LASER-PARTICULATE INTERACTIONS IN A DUSTY RF PLASMA, IEEE transactions on plasma science, 22(2), 1994, pp. 116-121

Authors: SURENDRA M VENDER D
Citation: M. Surendra et D. Vender, COLLISIONLESS ELECTRON HEATING BY RADIOFREQUENCY PLASMA SHEATHS, Applied physics letters, 65(2), 1994, pp. 153-155
Risultati: 1-16 |