Authors: BROWN KS TAYLOR BJ HORNAK LA WEIDMAN TW

Citation: Ks. Brown et al., CHARACTERIZATION OF POLY(PHENYLSILSESQUIOXANE) THIN-FILM PLANAR OPTICAL WAVE-GUIDES, IEEE photonics technology letters, 9(6), 1997, pp. 791-793

Authors: BOESE R CAMMACK JK MATZGER AJ PFLUG K TOLMAN WB VOLLHARDT KPC WEIDMAN TW

Citation: R. Boese et al., PHOTOCHEMISTRY OF (FULVALENE)TETRACARBONYLDIRUTHENIUM AND ITS DERIVATIVES - EFFICIENT LIGHT ENERGY-STORAGE DEVICES, Journal of the American Chemical Society, 119(29), 1997, pp. 6757-6773

Authors: JOUBERT O WEIDMAN TW JOSHI AM KOSTELAK RL

Citation: O. Joubert et al., APPLICATION OF PLASMA-POLYMERIZED METHYLSILANE IN AN ALL DRY RESIST PROCESS FOR 193 AND 248 NM LITHOGRAPHY, Microelectronic engineering, 30(1-4), 1996, pp. 275-278

Authors: KOSTELAK RL WEIDMAN TW VAIDYA S JOUBERT O PALMATEER SC HIBBS M

Citation: Rl. Kostelak et al., APPLICATION OF PLASMA-POLYMERIZED METHYLSILANE RESIST FOR ALL-DRY 193NM DEEP-ULTRAVIOLET PROCESSING, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 2994-2999

Authors: MA Y GREEN ML FELDMAN LC SAPJETA J HANSON KJ WEIDMAN TW

Citation: Y. Ma et al., VAPOR-PHASE SIO2 ETCHING AND METALLIC CONTAMINATION REMOVAL IN AN INTEGRATED CLUSTER SYSTEM, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(4), 1995, pp. 1460-1465

Authors: SCHILLING FC WEIDMAN TW JOSHI AM

Citation: Fc. Schilling et al., SOLID-STATE CHARACTERIZATION OF POLYSILANES CONTAINING THE SIH BOND, Macromolecular symposia, 86, 1994, pp. 131-143