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Results: 1-7 |
Results: 7
HIGH-DENSITY, INDUCTIVELY-COUPLED PLASMA ETCH OF SUB HALF-MICRON CRITICAL LAYERS - TRANSISTOR POLYSILICON GATE DEFINITION AND CONTACT FORMATION
Authors: WESTERHEIM AC JONES RD MAGER PJ DUBASH JH DALTON TJ GOSS MW BAUM SK DASS SK
Citation: Ac. Westerheim et al., HIGH-DENSITY, INDUCTIVELY-COUPLED PLASMA ETCH OF SUB HALF-MICRON CRITICAL LAYERS - TRANSISTOR POLYSILICON GATE DEFINITION AND CONTACT FORMATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(5), 1998, pp. 2699-2706
INTEGRATION OF CHEMICAL-VAPOR-DEPOSITION TITANIUM NITRIDE FOR 0.25 MU-M CONTACTS AND VIAS
Authors: WESTERHEIM AC BULGER JM WHELAN CS SRIRAM TS ELLIOTT LJ MAZIARZ JJ
Citation: Ac. Westerheim et al., INTEGRATION OF CHEMICAL-VAPOR-DEPOSITION TITANIUM NITRIDE FOR 0.25 MU-M CONTACTS AND VIAS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(5), 1998, pp. 2729-2733
SUBSTRATE BIAS EFFECTS IN HIGH-ASPECT-RATIO SIO2 CONTACT ETCHING USING AN INDUCTIVELY-COUPLED PLASMA REACTOR
Authors: WESTERHEIM AC LABUN AH DUBASH JH ARNOLD JC SAWIN HH YUWANG V
Citation: Ac. Westerheim et al., SUBSTRATE BIAS EFFECTS IN HIGH-ASPECT-RATIO SIO2 CONTACT ETCHING USING AN INDUCTIVELY-COUPLED PLASMA REACTOR, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(3), 1995, pp. 853-858
MICROSTRUCTURAL DEPENDENCE OF SPUTTERED YBA2CU3O7-X THIN-FILMS ON DEPOSITION PARAMETERS
Authors: BHATT D BASU SN WESTERHEIM AC ANDERSON AC
Citation: D. Bhatt et al., MICROSTRUCTURAL DEPENDENCE OF SPUTTERED YBA2CU3O7-X THIN-FILMS ON DEPOSITION PARAMETERS, Physica. C, Superconductivity, 222(3-4), 1994, pp. 283-296
RELATION BETWEEN ELECTRICAL-PROPERTIES AND MICROSTRUCTURE OF YBA2CU3O7-X THIN-FILMS DEPOSITED BY SINGLE-TARGET OFF-AXIS SPUTTERING
Authors: WESTERHEIM AC ANDERSON AC OATES DE BASU SN BHATT D CIMA MJ
Citation: Ac. Westerheim et al., RELATION BETWEEN ELECTRICAL-PROPERTIES AND MICROSTRUCTURE OF YBA2CU3O7-X THIN-FILMS DEPOSITED BY SINGLE-TARGET OFF-AXIS SPUTTERING, Journal of applied physics, 75(1), 1994, pp. 393-403
IN-SITU SUBSTRATE-TEMPERATURE MEASUREMENT IN HIGH-TC SUPERCONDUCTING FILM DEPOSITION
Authors: CHOI BI ANDERSON AC WESTERHEIM AC FLIK MI
Citation: Bi. Choi et al., IN-SITU SUBSTRATE-TEMPERATURE MEASUREMENT IN HIGH-TC SUPERCONDUCTING FILM DEPOSITION, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 11(6), 1993, pp. 3020-3025
COMPARISON OF THE SURFACE-MORPHOLOGY AND MICROSTRUCTURE OF IN-SITU AND EX-SITU DERIVED YBA2CU3O7-X THIN-FILMS
Authors: WESTERHEIM AC MCINTYRE PC BASU SN BHATT D YUJAHNES LS ANDERSON AC CIMA MJ
Citation: Ac. Westerheim et al., COMPARISON OF THE SURFACE-MORPHOLOGY AND MICROSTRUCTURE OF IN-SITU AND EX-SITU DERIVED YBA2CU3O7-X THIN-FILMS, Journal of electronic materials, 22(9), 1993, pp. 1113-1120
Risultati: 1-7 |