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Results:
1-7
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Results: 7
Authors:
Han, LQ
Pease, RF
Meisburger, WD
Winograd, GI
Takahashi, K
Citation: Lq. Han et al., Scaled measurements of global space-charge induced image blur in electron beam projection system, J VAC SCI B, 18(6), 2000, pp. 2999-3003
Authors:
Pease, RF
Han, LQ
Winograd, GI
Meisburger, WD
Pickard, D
McCord, MA
Citation: Rf. Pease et al., Prospects for charged particle lithography as a manufacturing technology, MICROEL ENG, 53(1-4), 2000, pp. 55-60
Authors:
Winograd, GI
Meisburger, WD
Pease, RFW
Citation: Gi. Winograd et al., Space-charge-induced aberrations, J VAC SCI B, 17(6), 1999, pp. 2803-2807
Authors:
Han, L
Pease, RFW
Meisburger, WD
Winograd, GI
McCord, MA
Citation: L. Han et al., Field size versus column shortness in high throughput electron beam lithography, J VAC SCI B, 17(6), 1999, pp. 2830-2835
Authors:
Winograd, GI
Han, L
McCord, MA
Pease, RFW
Krishnamurthi, V
Citation: Gi. Winograd et al., Multiplexed blanker array for parallel electron beam lithography, J VAC SCI B, 16(6), 1998, pp. 3174-3176
Authors:
Schneider, JE
Sen, P
Pickard, DS
Winograd, GI
McCord, MA
Pease, RFW
Spicer, WE
Baum, AW
Costello, KA
Davis, GA
Citation: Je. Schneider et al., Patterned negative electron affinity photocathodes for maskless electron beam lithography, J VAC SCI B, 16(6), 1998, pp. 3192-3196
Authors:
Han, LQ
McCord, MA
Winograd, GI
Pease, RFW
Citation: Lq. Han et al., Performance investigation of Coulomb interaction-limited high through put electron beam lithography based on empirical modeling, J VAC SCI B, 16(6), 1998, pp. 3215-3220
Risultati:
1-7
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