Authors: White, DL Wood, OR

Citation: Dl. White et Or. Wood, Novel alignment system for imprint lithography, J VAC SCI B, 18(6), 2000, pp. 3552-3556

Authors: Spector, SJ White, DL Tennant, DM Ocola, LE Novembre, AE Peabody, ML Wood, OR

Citation: Sj. Spector et al., Technique for rapid at-wavelength inspection of extreme ultraviolet mask blanks, J VAC SCI B, 17(6), 1999, pp. 3003-3008

Authors: White, DL Cirelli, RA Spector, SJ Wood, OR

Citation: Dl. White et al., Lithographic projectors with dark-field illumination, J VAC SCI B, 17(6), 1999, pp. 3301-3305

Authors: White, DL Wood, OR

Citation: Dl. White et Or. Wood, Evaluation of a two-mask resolution enhancement technique, J VAC SCI B, 16(6), 1998, pp. 3411-3414