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Results:
1-4
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Results: 4
Novel alignment system for imprint lithography
Authors:
White, DL Wood, OR
Citation:
Dl. White et Or. Wood, Novel alignment system for imprint lithography, J VAC SCI B, 18(6), 2000, pp. 3552-3556
Technique for rapid at-wavelength inspection of extreme ultraviolet mask blanks
Authors:
Spector, SJ White, DL Tennant, DM Ocola, LE Novembre, AE Peabody, ML Wood, OR
Citation:
Sj. Spector et al., Technique for rapid at-wavelength inspection of extreme ultraviolet mask blanks, J VAC SCI B, 17(6), 1999, pp. 3003-3008
Lithographic projectors with dark-field illumination
Authors:
White, DL Cirelli, RA Spector, SJ Wood, OR
Citation:
Dl. White et al., Lithographic projectors with dark-field illumination, J VAC SCI B, 17(6), 1999, pp. 3301-3305
Evaluation of a two-mask resolution enhancement technique
Authors:
White, DL Wood, OR
Citation:
Dl. White et Or. Wood, Evaluation of a two-mask resolution enhancement technique, J VAC SCI B, 16(6), 1998, pp. 3411-3414
Risultati:
1-4
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