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Results:
1-11
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Results: 11
Authors:
HORIKAWA T
YUUKI A
SHIBANO T
KAWAHARA T
MAKITA T
KUROIWA T
YAMAMUKA M
OOMORI T
MIKAMI N
ONO K
Citation: T. Horikawa et al., NOVEL STACKED CAPACITOR TECHNOLOGY FOR 1-GBIT DRAMS WITH (BA,SR)TIO3 THIN-FILMS, Electronics & communications in Japan. Part 2, Electronics, 80(5), 1997, pp. 70-78
Authors:
FURUKAWA T
YUUKI A
ONO K
Citation: T. Furukawa et al., RECOVERY OF TIME-DEPENDENT DIELECTRIC-BREAKDOWN LIFETIME OF THIN OXIDE-FILMS BY THERMAL ANNEALING, Journal of applied physics, 82(7), 1997, pp. 3462-3468
Authors:
KAWAHARA T
YAMAMUKA M
YUUKI A
ONO K
Citation: T. Kawahara et al., (BA, SR)TIO3 FILMS PREPARED BY LIQUID SOURCE CHEMICAL-VAPOR-DEPOSITION ON RU ELECTRODES, JPN J A P 1, 35(9B), 1996, pp. 4880-4885
Authors:
YAMAMUKA M
KAWAHARA T
MAKITA T
YUUKI A
ONO K
Citation: M. Yamamuka et al., THERMAL-DESORPTION SPECTROSCOPY OF (BA, SR)TIO3 THIN-FILMS PREPARED BY CHEMICAL-VAPOR-DEPOSITION, JPN J A P 1, 35(2A), 1996, pp. 729-735
Authors:
MIKAMI N
KAWAHARA T
HORIKAWA T
YAMAMUKA M
MAKITA T
KUROIWA T
YUUKI A
SHIBANO T
OOMORI T
ONO K
SATOH S
ABE H
Citation: N. Mikami et al., (BA,SR)TIO3 CAPACITOR TECHNOLOGY FOR GBIT-SCALE DRAMS, Journal of the Korean Physical Society, 29, 1996, pp. 598-602
Authors:
KAWAHARA T
YAMAMUKA M
YUUKI A
ONO K
Citation: T. Kawahara et al., SURFACE MORPHOLOGIES AND ELECTRICAL-PROPERTIES OF (BA,SR)TIO3 FILMS PREPARED BY 2-STEP DEPOSITION OF LIQUID SOURCE CHEMICAL-VAPOR-DEPOSITION, JPN J A P 1, 34(9B), 1995, pp. 5077-5082
Authors:
KAWAHARA T
YAMAMUKA M
MAKITA T
NAKA J
YUUKI A
MIKAMI N
ONO K
Citation: T. Kawahara et al., STEP COVERAGE AND ELECTRICAL-PROPERTIES OF (BA, SR)TIO3 FILMS PREPARED BY LIQUID SOURCE CHEMICAL-VAPOR-DEPOSITION USING TIO(DPM)(2), JPN J A P 1, 33(9B), 1994, pp. 5129-5134
Authors:
TUDA M
ONO K
YUUKI A
Citation: M. Tuda et al., TRANSPORT AND DEPOSITION PROCESSES OF SPUTTERED PARTICLES IN RF-MICROWAVE HYBRID SPUTTERING DISCHARGES, JPN J A P 1, 33(7B), 1994, pp. 4473-4477
Authors:
KAWAHARA T
YAMAMUKA M
MAKITA T
TSUTAHARA K
YUUKI A
ONO K
MATSUI Y
Citation: T. Kawahara et al., PREPARATION OF (BA, SR)TIO3 THIN-FILMS BY CHEMICAL-VAPOR-DEPOSITION USING LIQUID SOURCES, JPN J A P 1, 33(10), 1994, pp. 5897-5902
Authors:
BANJOU T
TSUTAHARA K
KAWAHARA T
YUUKI A
MATSUI Y
Citation: T. Banjou et al., REACTION ANALYSIS AND APPARATUS DEVELOPME NT OF TEOS O-3 ATMOSPHERIC-PRESSURE CVD/, Kagaku kogaku ronbunshu, 20(5), 1994, pp. 610-617
Authors:
BANJOU T
SAKAMOTO K
TSUTAHARA K
YAMAGUCHI T
YUUKI A
KAWAHARA T
Citation: T. Banjou et al., A DEVELOPMENT OF SINGLE-WAFER TYPE APCVD EQUIPMENT FOR SIO2 FILM DEPOSITION, Kagaku kogaku ronbunshu, 20(4), 1994, pp. 489-496
Risultati:
1-11
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