Citation: S. Yasin et al., Nanolithography using ultrasonically assisted development of calixarene negative electron beam resist, J VAC SCI B, 19(1), 2001, pp. 311-313
Citation: W. Wilcke et al., Change in water quality during the passage through a tropical montane rainforest in Ecuador, BIOGEOCHEMI, 55(1), 2001, pp. 45-72
Citation: S. Yasin et al., Fabrication of < 5 nm width lines in poly(methylmethacrylate) resist usinga water : isopropyl alcohol developer and ultrasonically-assisted development, APPL PHYS L, 78(18), 2001, pp. 2760-2762
Authors:
Abed, A
Carbonel, P
Collina-Girard, J
Fontugne, M
Petit-Maire, N
Reyss, JC
Yasin, S
Citation: A. Abed et al., A palaeolake from the Last Pleistocene interglacial phase in the hyperaridsouthern area of Jordan., CR AC S IIA, 330(4), 2000, pp. 259-264
Citation: Dg. Hasko et al., Influence of developer and development conditions on the behavior of high molecular weight electron beam resists, J VAC SCI B, 18(6), 2000, pp. 3441-3444
Citation: S. Yasin et al., Comparison of sensitivity and exposure latitude for polymethylmethacrylate, UVIII, and calixarene using conventional dip and ultrasonically assisted development, J VAC SCI B, 17(6), 1999, pp. 3390-3393