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Results:
1-18
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Results: 18
Authors:
von Keudell, A
Meier, M
Schwarz-Selinger, T
Citation: A. Von Keudell et al., Simultaneous interaction of methyl radicals and atomic hydrogen with amorphous hydrogenated carbon films, as investigated with optical in situ diagnostics, APPL PHYS A, 72(5), 2001, pp. 551-556
Authors:
Schwarz-Selinger, T
Dose, V
Jacob, W
von Keudell, A
Citation: T. Schwarz-selinger et al., Quantification of a radical beam source for methyl radicals, J VAC SCI A, 19(1), 2001, pp. 101-107
Authors:
von Keudell, A
Schwarz-Selinger, T
Jacob, W
Stevens, A
Citation: A. Von Keudell et al., Surface reactions of hydrocarbon radicals: suppression of the re-deposition in fusion experiments via a divertor liner, J NUCL MAT, 290, 2001, pp. 231-237
Authors:
Meier, M
von Keudell, A
Citation: M. Meier et A. Von Keudell, Hydrogen elimination as a key step for the formation of polymerlike hydrocarbon films, J APPL PHYS, 90(7), 2001, pp. 3585-3594
Authors:
von Keudell, A
Schwarz-Selinger, T
Jacob, W
Citation: A. Von Keudell et al., Simultaneous interaction of methyl radicals and atomic hydrogen with amorphous hydrogenated carbon films, J APPL PHYS, 89(5), 2001, pp. 2979-2986
Authors:
von Keudell, A
Citation: A. Von Keudell, Surface processes during thin-film growth, PLASMA SOUR, 9(4), 2000, pp. 455-467
Authors:
Schwarz-Selinger, T
von Keudell, A
Jacob, W
Citation: T. Schwarz-selinger et al., Novel method for absolute quantification of the flux and angular distribution of a radical source for atomic hydrogen, J VAC SCI A, 18(3), 2000, pp. 995-1001
Authors:
Jacob, W
von Keudell, A
Schwarz-Selinger, T
Citation: W. Jacob et al., Infrared analysis of thin films: Amorphous, hydrogenated carbon on silicon, BRAZ J PHYS, 30(3), 2000, pp. 508-516
Authors:
Bullen, AJ
O'Hara, KE
Cahill, DG
Monteiro, O
von Keudell, A
Citation: Aj. Bullen et al., Thermal conductivity of amorphous carbon thin films, J APPL PHYS, 88(11), 2000, pp. 6317-6320
Authors:
Hopf, C
Schwarz-Selinger, T
Jacob, W
von Keudell, A
Citation: C. Hopf et al., Surface loss probabilities of hydrocarbon radicals on amorphous hydrogenated carbon film surfaces, J APPL PHYS, 87(6), 2000, pp. 2719-2725
Authors:
von Keudell, A
Schwarz-Selinger, T
Meier, M
Jacob, W
Citation: A. Von Keudell et al., Direct identification of the synergism between methyl radicals and atomic hydrogen during growth of amorphous hydrogenated carbon films (vol 76, pg 676, 2000), APPL PHYS L, 77(3), 2000, pp. 459-459
Authors:
von Keudell, A
Schwarz-Selinger, T
Meier, M
Jacob, W
Citation: A. Von Keudell et al., Direct identification of the synergism between methyl radicals and atomic hydrogen during growth of amorphous hydrogenated carbon films, APPL PHYS L, 76(6), 2000, pp. 676-678
Authors:
von Keudell, A
Abelson, JR
Citation: A. Von Keudell et Jr. Abelson, Thermally induced changes in the hydrogen microstructure of amorphous hydrogenated silicon films, analyzed using in situ real time infrared spectroscopy, JPN J A P 1, 38(7A), 1999, pp. 4002-4006
Authors:
von Keudell, A
Abelson, JR
Citation: A. Von Keudell et Jr. Abelson, Direct insertion of SiH3 radicals into strained Si-Si surface bonds duringplasma deposition of hydrogenated amorphous silicon films, PHYS REV B, 59(8), 1999, pp. 5791-5798
Authors:
von Keudell, A
Hopf, C
Schwarz-Selinger, T
Jacob, W
Citation: A. Von Keudell et al., Surface loss probabilities of hydrocarbon radicals on amorphous hydrogenated carbon film surfaces: Consequences for the formation of re-deposited layers in fusion experiments, NUCL FUSION, 39(10), 1999, pp. 1451-1462
Authors:
Landkammer, B
von Keudell, A
Jacob, W
Citation: B. Landkammer et al., Erosion of thin hydrogenated carbon films in oxygen, oxygen/hydrogen and water plasmas, J NUCL MAT, 264(1-2), 1999, pp. 48-55
Authors:
Schwarz-Selinger, T
von Keudell, A
Jacob, W
Citation: T. Schwarz-selinger et al., Plasma chemical vapor deposition of hydrocarbon films: The influence of hydrocarbon source gas on the film properties, J APPL PHYS, 86(7), 1999, pp. 3988-3996
Authors:
Hopf, C
Letourneur, K
Jacob, W
Schwarz-Selinger, T
von Keudell, A
Citation: C. Hopf et al., Surface loss probabilities of the dominant neutral precursors for film growth in methane and acetylene discharges, APPL PHYS L, 74(25), 1999, pp. 3800-3802
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