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Results: 1-9 |
Results: 9

Authors: HILD R NITZSCHE G MUSCHALL R ALTENBURGER U WIENECKE J
Citation: R. Hild et al., INVESTIGATIONS INTO THE SPECTRAL BEHAVIOR OF WAFERS AND THE CD-MEASUREMENT, Microelectronic engineering, 30(1-4), 1996, pp. 583-585

Authors: HILD R NITZSCHE G ALTENBURGER U
Citation: R. Hild et al., THE CHALLENGES OF COLOR FOR WAFER INSPECTION FROM THE VIEWPOINT OF PARTIALLY COHERENT IMAGING THEORY, Microelectronic engineering, 26(3-4), 1995, pp. 195-215

Authors: HILD R NITZSCHE G ALTENBURGER U
Citation: R. Hild et al., SUPERRESOLUTION LITHOGRAPHY FROM THE VIEWPOINT OF PARTIALLY COHERENT IMAGING THEORY .1. LINE AND SPACE STRUCTURES, Microelectronic engineering, 26(2), 1995, pp. 71-92

Authors: HILD R NITZSCHE G ALTENBURGER U
Citation: R. Hild et al., SUPERRESOLUTION LITHOGRAPHY FROM THE VIEWPOINT OF PARTIALLY COHERENT IMAGING THEORY .2. ISOLATED STRUCTURES, Microelectronic engineering, 26(2), 1995, pp. 93-106

Authors: HILD R NITZSCHE G ALTENBURGER U
Citation: R. Hild et al., OPTICAL PREPROCESSING AS INSPECTION TOOL, Optik, 99(3), 1995, pp. 123-133

Authors: HILD R ALTENBURGER U NITZSCHE G WIENECKE J OTHER H
Citation: R. Hild et al., ON THE SIMULATION OF THE IMAGING PROPERTIES OF SPIKE DEFECTS, Optik, 99(2), 1995, pp. 55-61

Authors: HILD R NITZSCHE G ALTENBURGER U
Citation: R. Hild et al., PHYSICAL LIMITS OF SUPERRESOLUTION LITHOGRAPHY, Microelectronic engineering, 23(1-4), 1994, pp. 179-182

Authors: NITZSCHE G HILD R ALTENBURGER U OTHER H
Citation: G. Nitzsche et al., OPTICAL-IMAGE PROCESSING - A USEFUL TOOL IN WAFER INSPECTION, Microelectronic engineering, 23(1-4), 1994, pp. 391-394

Authors: HILD R NITZSCHE G ALTENBURGER U
Citation: R. Hild et al., PHYSICAL LIMITS OF SUPERRESOLUTION LITHOGRAPHY, Optik, 98(1), 1994, pp. 39-43
Risultati: 1-9 |