Authors:
Dosev, DK
Puigdollers, J
Orpella, A
Voz, C
Fonrodona, M
Soler, D
Marsal, LF
Pallares, J
Bertomeu, J
Andreu, J
Alcubilla, R
Citation: Dk. Dosev et al., Analysis of bias stress on thin-film transistors obtained by Hot-Wire Chemical Vapour Deposition, THIN SOL FI, 383(1-2), 2001, pp. 307-309
Authors:
Martin, I
Vetter, M
Orpella, A
Puigdollers, J
Cuevas, A
Alcubilla, R
Citation: I. Martin et al., Surface passivation of p-type crystalline Si by plasma enhanced chemical vapor deposited amorphous SiCx : H films, APPL PHYS L, 79(14), 2001, pp. 2199-2201
Authors:
Orpella, A
Puigdollers, J
Bardes, D
Alcubilla, R
Marsal, LF
Pallares, J
Citation: A. Orpella et al., Fabrication and characterization of in situ-doped a-Si0.8C0.2 emitter bipolar transistors, SOL ST ELEC, 44(9), 2000, pp. 1543-1548
Authors:
Marsal, LF
Pallares, J
Correig, X
Orpella, A
Bardes, D
Alcubilla, R
Citation: Lf. Marsal et al., Analysis of conduction mechanisms in annealed n-Si1-xCx : H/p-crystalline Si heterojunction diodes for different doping concentrations, J APPL PHYS, 85(2), 1999, pp. 1216-1221