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Results: 1-25 | 26-50 | 51-75 | 76-84
Results: 1-25/84

Authors: Hens, S Van Landuyt, J Bender, H Boullart, W Vanhaelemeersch, S
Citation: S. Hens et al., Chemical and structural analysis of etching residue layers in semiconductor devices with energy filtering transmission electron microscopy, MAT SC S PR, 4(1-3), 2001, pp. 109-111

Authors: Stuer, C Van Landuyt, J Bender, H Rooyackers, R Badenes, G
Citation: C. Stuer et al., The use of convergent beam electron diffraction for stress measurements inshallow trench isolation structures, MAT SC S PR, 4(1-3), 2001, pp. 117-119

Authors: Simoen, E Loo, R Roussel, P Caymax, M Bender, H Claeys, C Herzog, HJ Blondeel, A Clauws, P
Citation: E. Simoen et al., Defect analysis of n-type silicon strained layers, MAT SC S PR, 4(1-3), 2001, pp. 225-227

Authors: Campomizzi, EC Bender, H von Hellens, W
Citation: Ec. Campomizzi et al., Improving the heat resistance of hydrogenated nitrile rubber compounds - Part 2: Effects of a novel heat stabilizer additive on the heat resistance of HNBR, KAUT GUM KU, 54(3), 2001, pp. 114-121

Authors: Bender, H Campomizzi, E
Citation: H. Bender et E. Campomizzi, Improving the heat resistance of hydrogenated nitrile rubber compounds Part 1: Aging mechanisms for high saturation rubber compounds, KAUT GUM KU, 54(1-2), 2001, pp. 14

Authors: Ghica, C Nistor, L Bender, H Steegen, A Lauwers, A Maex, K Van Landuyt, J
Citation: C. Ghica et al., In situ transmission electron microscopy study of the silicidation processin Co thin films on patterned (001) Si substrates, J MATER RES, 16(3), 2001, pp. 701-708

Authors: Norga, GJ Jin, S Fe, L Wouters, DJ Bender, H Maes, HE
Citation: Gj. Norga et al., Growth of (111)-oriented Pb(Zr,Ti)O-3 layers on nanocrystalline RuO2 electrodes using the sol-gel technique, J MATER RES, 16(3), 2001, pp. 828-833

Authors: Houssa, M Naili, M Zhao, C Bender, H Heyns, MM Stesmans, A
Citation: M. Houssa et al., Effect of O-2 post-deposition anneals on the properties of ultra-thin SiOx/ZrO2 gate dielectric stacks, SEMIC SCI T, 16(1), 2001, pp. 31-38

Authors: Bender, H
Citation: H. Bender, The diaries, 2000/2001, SINN FORM, 53(5), 2001, pp. 648-663

Authors: Zhao, C Roebben, G Bender, H Young, E Haukka, S Houssa, M Naili, M De Gendt, S Heyns, M Van Der Biest, O
Citation: C. Zhao et al., In situ crystallisation in ZrO2 thin films during high temperature X-ray diffraction, MICROEL REL, 41(7), 2001, pp. 995-998

Authors: Becker, M Bender, H Jansen, M Kienle, L Assenmacher, W
Citation: M. Becker et al., Efficient access to bamboo-like carbon micro and nanofibres by pyrolysis of zinc cyanamide, J PHYS CH S, 62(8), 2001, pp. 1431-1433

Authors: Nemeth, S Boeve, H Liu, ZY Attenborough, K Bender, H Nistor, L Borghs, G De Boeck, J
Citation: S. Nemeth et al., Tunneling spectroscopy in Fe-GaN-Fe trilayer structures grown by MBE usingECR microwave plasma nitrogen source, J CRYST GR, 227, 2001, pp. 888-892

Authors: Loo, R Meunier-Beillard, P Vanhaeren, D Bender, H Caymax, M Vandervorst, W Dentel, D Goryll, M Vescan, L
Citation: R. Loo et al., Structural and optical properties of Ge islands grown in an industrial chemical vapor deposition reactor, J APPL PHYS, 90(5), 2001, pp. 2565-2574

Authors: Teodorescu, V Nistor, L Bender, H Steegen, A Lauwers, A Maex, K Van Landuyt, J
Citation: V. Teodorescu et al., In situ transmission electron microscopy study of Ni silicide phases formed on (001) Si active lines, J APPL PHYS, 90(1), 2001, pp. 167-174

Authors: Detavernier, C Van Meirhaeghe, RL Cardon, F Maex, K Bender, H Brijs, B Vandervorst, W
Citation: C. Detavernier et al., Formation of epitaxial CoSi2 by a Cr or Mo interlayer: Comparison with a Ti interlayer, J APPL PHYS, 89(4), 2001, pp. 2146-2150

Authors: Sedky, S Witvrouw, A Bender, H Baert, K
Citation: S. Sedky et al., Experimental determination of the maximum post-process annealing temperature for standard CMOS wafers, IEEE DEVICE, 48(2), 2001, pp. 377-385

Authors: Claes, M De Gendt, S Kenens, C Conard, T Bender, H Storm, W Bauer, T Mertens, P
Citation: M. Claes et al., Controlled deposition of organic contamination and removal with ozone-based cleanings, J ELCHEM SO, 148(3), 2001, pp. G118-G125

Authors: Stuer, C Van Landuyt, J Bender, H De Wolf, I Rooyackers, R Badenes, G
Citation: C. Stuer et al., Investigation by convergent beam electron diffraction of the stress aroundshallow trench isolation structures, J ELCHEM SO, 148(11), 2001, pp. G597-G601

Authors: Stalmans, L Poortmans, J Bender, H Jin, S Conard, T Nijs, J Debarge, L Slaoui, A
Citation: L. Stalmans et al., Effects of low-thermal-budget treatments on the porous Si material properties, J POROUS MA, 7(1-3), 2000, pp. 67-71

Authors: Vantomme, A Wu, MF Hogg, S Langouche, G Jacobs, K Moerman, I White, ME O'Donnell, KP Nistor, L Van Landuyt, J Bender, H
Citation: A. Vantomme et al., Comparative study of structural properties and photoluminescence in InGaN layers with a high In content, MRS I J N S, 5, 2000, pp. NIL_604-NIL_609

Authors: Risse, JH Grunwald, E Kersjes, W Strunk, H Caselmann, WH Palmedo, H Bender, H Biersack, HJ
Citation: Jh. Risse et al., Intraarterial HCC therapy with I-131-Lipiodol, CANC BIO R, 15(1), 2000, pp. 65-70

Authors: Baklanov, MR Van Hove, M Mannaert, G Vanhaelemeersch, S Bender, H Conard, T Maex, K
Citation: Mr. Baklanov et al., Low temperature oxidation and selective etching of chemical vapor deposition a-SiC : H films, J VAC SCI B, 18(3), 2000, pp. 1281-1287

Authors: Li, H Jin, S Bender, H Lanckmans, F Heyvaert, I Maex, K Froyen, L
Citation: H. Li et al., Characterization of WF6/N-2/H-2 plasma enhanced chemical vapor deposited WxN films as barriers for Cu metallization, J VAC SCI B, 18(1), 2000, pp. 242-251

Authors: Bender, H Fischer, T Kaenel, HMV Mackensen, M Nuber, HU
Citation: H. Bender et al., Archaeology of Roman provinces versus provincial archaeology of Rome at German universities, ARCHAOL NAC, 5(3), 2000, pp. 312-321

Authors: Heil, J Bohm, A Groger, A Primke, M Wyder, P Keppler, P Major, J Bender, H Schonherr, E Wendel, H Wolf, B Wurz, KU Grill, W Herrnberger, H Knauth, S Lenzner, J
Citation: J. Heil et al., Electron focusing in metals and semimetals, PHYS REPORT, 323(5), 2000, pp. 388-455
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