Authors: Pfeiffer, K Fink, A Gruetzner, G Bleidiessel, G Schulz, H Scheer, H

Citation: K. Pfeiffer et al., Multistep profiles by mix and match of nanoimprint and UV lithography, MICROEL ENG, 57-8, 2001, pp. 381-387

Authors: Schulz, H Lyebyedyev, D Scheer, HC Pfeiffer, K Bleidiessel, G Grutzner, G Ahopelto, J

Citation: H. Schulz et al., Master replication into thermosetting polymers for nanoimprinting, J VAC SCI B, 18(6), 2000, pp. 3582-3585

Authors: Schulz, H Scheer, HC Hoffmann, T Torres, CMS Pfeiffer, K Bleidiessel, G Grutzner, G Cardinaud, C Gaboriau, F Peignon, MC Ahopelto, J Heidari, B

Citation: H. Schulz et al., New polymer materials for nanoimprinting, J VAC SCI B, 18(4), 2000, pp. 1861-1865

Authors: Pfeiffer, K Fink, M Bleidiessel, G Gruetzner, G Schulz, H Scheer, HC Hoffmann, T Torres, CMS Gaboriau, F Cardinaud, C

Citation: K. Pfeiffer et al., Novel linear and crosslinking polymers for nanoimprinting with high etch resistance, MICROEL ENG, 53(1-4), 2000, pp. 411-414

Authors: Gaboriau, F Peignon, MC Barreau, A Turban, G Cardinaud, C Pfeiffer, K Bleidiessel, G Grutzner, G

Citation: F. Gaboriau et al., High density fluorocarbon plasma etching of new resists suitable for nano-imprint lithography, MICROEL ENG, 53(1-4), 2000, pp. 501-505

Authors: Pfeiffer, K Bleidiessel, G Gruetzner, G Schulz, H Hoffmann, T Scheer, HC Torres, CMS Ahopelto, J

Citation: K. Pfeiffer et al., Suitability of new polymer materials with adjustable glass temperature fornano-imprinting, MICROEL ENG, 46(1-4), 1999, pp. 431-434