Authors:
REED J
TAO M
PARK DG
BOTCHKAREV A
FAN Z
SUZUE SK
LI D
GAO GB
MOHAMMAD SN
CHEY SJ
VANNOSTRAND JE
CAHILL DG
MORKOC H
Citation: J. Reed et al., CHARACTERISTICS OF IN-SITU DEPOSITED GAAS METAL-INSULATOR-SEMICONDUCTOR STRUCTURES, Solid-state electronics, 38(7), 1995, pp. 1351-1357
Authors:
VANNOSTRAND JE
CHEY SJ
HASAN MA
CAHILL DG
GREENE JE
Citation: Je. Vannostrand et al., SURFACE-MORPHOLOGY DURING MULTILAYER EPITAXIAL-GROWTH OF GE(001), Physical review letters, 74(7), 1995, pp. 1127-1130
Authors:
PARK DG
TAO M
REED J
SUZUE K
BOTCHKAREV AE
FAN Z
GAO GB
CHEY SJ
VANNOSTRAND J
CAHILL DG
MORKOC H
Citation: Dg. Park et al., GAAS-BASED METAL-INSULATOR-SEMICONDUCTOR STRUCTURES WITH LOW INTERFACE TRAPS USING MOLECULAR-BEAM EPITAXY AND CHEMICAL-VAPOR-DEPOSITION, Journal of crystal growth, 150(1-4), 1995, pp. 1275-1280
Authors:
TAO M
BOTCHKAREV AE
PARK D
REED J
CHEY SJ
VANNOSTRAND JE
CAHILL DG
MORKOC H
Citation: M. Tao et al., IMPROVED SI3N4 SI/GAAS METAL-INSULATOR-SEMICONDUCTOR INTERFACES BY IN-SITU ANNEAL OF THE AS-DEPOSITED SI/, Journal of applied physics, 77(8), 1995, pp. 4113-4115
Citation: Dg. Cahill et Th. Allen, THERMAL-CONDUCTIVITY OF SPUTTERED AND EVAPORATED SIO2 AND TIO2 OPTICAL COATINGS, Applied physics letters, 65(3), 1994, pp. 309-311