Authors: INOUE K MIKAGI K ABIKO H CHIKAKI S KIKKAWA T

Citation: K. Inoue et al., A NEW COBALT SALICIDE TECHNOLOGY FOR 0.15-MU-M CMOS DEVICES, I.E.E.E. transactions on electron devices, 45(11), 1998, pp. 2312-2318

Authors: TUNG RT FUJII K KIKUTA K CHIKAKI S KIKAWA T

Citation: Rt. Tung et al., GROWTH OF TISI2 FROM CODEPOSITED TISIX LAYERS AND INTERFACIAL LAYERS, Applied physics letters, 70(18), 1997, pp. 2386-2388

Authors: HAYASHI Y SAKURAI M NAKAJIMA T HAYASHI K SASAKI S CHIKAKI S KUNIO T

Citation: Y. Hayashi et al., AMMONIUM-SALT-ADDED SILICA SLURRY FOR THE CHEMICAL-MECHANICAL POLISHING OF THE INTERLAYER DIELECTRIC FILM PLANARIZATION IN ULSIS, JPN J A P 1, 34(2B), 1995, pp. 1037-1042

Authors: TRANCONG Q KANATO H CHIKAKI S

Citation: Q. Trancong et al., EXTREMELY SLOW REORIENTATION DYNAMICS OF MOLECULAR TRACERS IN GLASSY-POLYMERS, Journal of molecular liquids, 65-6, 1995, pp. 325-328

Authors: TRANCONG Q CHIKAKI S KANATO H

Citation: Q. Trancong et al., RELATIONSHIP BETWEEN REORIENTATIONAL MOTIONS OF A PHOTOCHROMIC DOPANTAND LOCAL RELAXATION PROCESSES OF A GLASSY POLYMER MATRIX, Polymer, 35(20), 1994, pp. 4465-4469