AAAAAA

   
Results: 1-21 |
Results: 21
ELECTRON INTERACTIONS WITH C3F8
Authors: CHRISTOPHOROU LG OLTHOFF JK
Citation: Lg. Christophorou et Jk. Olthoff, ELECTRON INTERACTIONS WITH C3F8, Journal of physical and chemical reference data, 27(5), 1998, pp. 889-913
ELECTRON INTERACTIONS WITH C2F6
Authors: CHRISTOPHOROU LG OLTHOFF JK
Citation: Lg. Christophorou et Jk. Olthoff, ELECTRON INTERACTIONS WITH C2F6, Journal of physical and chemical reference data, 27(1), 1998, pp. 1-29
EFFECT OF TEMPERATURE ON ELECTRON-ATTACHMENT TO AND NEGATIVE-ION STATES OF CCL2F2
Authors: WANG YC CHRISTOPHOROU LG VERBRUGGE JK
Citation: Yc. Wang et al., EFFECT OF TEMPERATURE ON ELECTRON-ATTACHMENT TO AND NEGATIVE-ION STATES OF CCL2F2, The Journal of chemical physics, 109(19), 1998, pp. 8304-8310
SULFUR-HEXAFLUORIDE AND THE ELECTRIC-POWER INDUSTRY
Authors: CHRISTOPHOROU LG OLTHOFF JK VANBRUNT RJ
Citation: Lg. Christophorou et al., SULFUR-HEXAFLUORIDE AND THE ELECTRIC-POWER INDUSTRY, IEEE electrical insulation magazine, 13(5), 1997, pp. 20-24
ELECTRON INTERACTIONS WITH CCL2F2
Authors: CHRISTOPHOROU LG OLTHOFF JK WANG YC
Citation: Lg. Christophorou et al., ELECTRON INTERACTIONS WITH CCL2F2, Journal of physical and chemical reference data, 26(5), 1997, pp. 1205-1237
ELECTRON INTERACTIONS WITH CHF3
Authors: CHRISTOPHOROU LG OLTHOFF JK RAO MVVS
Citation: Lg. Christophorou et al., ELECTRON INTERACTIONS WITH CHF3, Journal of physical and chemical reference data, 26(1), 1997, pp. 1-15
THE DEPENDENCE OF THE THERMAL ELECTRON-ATTACHMENT RATE-CONSTANT IN GASES AND LIQUIDS ON THE ENERGY POSITION OF THE ELECTRON ATTACHING STATE
Authors: CHRISTOPHOROU LG
Citation: Lg. Christophorou, THE DEPENDENCE OF THE THERMAL ELECTRON-ATTACHMENT RATE-CONSTANT IN GASES AND LIQUIDS ON THE ENERGY POSITION OF THE ELECTRON ATTACHING STATE, Zeitschrift für physikalische Chemie, 195, 1996, pp. 195-215
ELECTRON INTERACTIONS WITH CF4
Authors: CHRISTOPHOROU LG OLTHOFF JK RAO MVVS
Citation: Lg. Christophorou et al., ELECTRON INTERACTIONS WITH CF4, Journal of physical and chemical reference data, 25(5), 1996, pp. 1341-1388
SF6 N-2 MIXTURES - BASIC AND HV INSULATION PROPERTIES/
Authors: CHRISTOPHOROU LG VANBRUNT RJ
Citation: Lg. Christophorou et Rj. Vanbrunt, SF6 N-2 MIXTURES - BASIC AND HV INSULATION PROPERTIES/, IEEE transactions on dielectrics and electrical insulation, 2(5), 1995, pp. 952-1003
ENHANCED NEGATIVE-ION FORMATION IN ARF-LASER IRRADIATED METHANE - POSSIBLE IMPLICATIONS FOR PLASMA PROCESSING DISCHARGES
Authors: PINNADUWAGE LA MARTIN MZ CHRISTOPHOROU LG
Citation: La. Pinnaduwage et al., ENHANCED NEGATIVE-ION FORMATION IN ARF-LASER IRRADIATED METHANE - POSSIBLE IMPLICATIONS FOR PLASMA PROCESSING DISCHARGES, Contributions to Plasma Physics, 35(4-5), 1995, pp. 433-438
EFFECT OF TEMPERATURE ON THE FORMATION AND AUTODESTRUCTION OF PARENT ANIONS
Authors: CHRISTOPHOROU LG DATSKOS PG
Citation: Lg. Christophorou et Pg. Datskos, EFFECT OF TEMPERATURE ON THE FORMATION AND AUTODESTRUCTION OF PARENT ANIONS, International journal of mass spectrometry and ion processes, 150, 1995, pp. 59-77
PHOTODETACHMENT OF SF6-
Authors: DATSKOS PG CARTER JG CHRISTOPHOROU LG
Citation: Pg. Datskos et al., PHOTODETACHMENT OF SF6-, Chemical physics letters, 239(1-3), 1995, pp. 38-43
LASING IN AL FOLLOWING PHOTOIONIZATION AND NEUTRALIZATION IN THE PRESENCE OF H-2 - THE ROLE OF H-
Authors: KIELKOPF JF PINNADUWAGE LA CHRISTOPHOROU LG
Citation: Jf. Kielkopf et al., LASING IN AL FOLLOWING PHOTOIONIZATION AND NEUTRALIZATION IN THE PRESENCE OF H-2 - THE ROLE OF H-, Physical review. A, 49(4), 1994, pp. 2675-2680
PHOTODETACHMENT IN THE GASEOUS, LIQUID, AND SOLID STATES OF MATTER
Authors: CHRISTOPHOROU LG DATSKOS PG FAIDAS H
Citation: Lg. Christophorou et al., PHOTODETACHMENT IN THE GASEOUS, LIQUID, AND SOLID STATES OF MATTER, The Journal of chemical physics, 101(8), 1994, pp. 6728-6742
TEMPERATURE-ENHANCED ELECTRON DETACHMENT FROM C6F6- NEGATIVE-IONS - REPLY
Authors: CHRISTOPHOROU LG DATSKOS PG CARTER JG
Citation: Lg. Christophorou et al., TEMPERATURE-ENHANCED ELECTRON DETACHMENT FROM C6F6- NEGATIVE-IONS - REPLY, The Journal of chemical physics, 100(9), 1994, pp. 6983-6983
VERIFICATION OF H- FORMATION IN ULTRAVIOLET-LASER-IRRADIATED HYDROGEN- IMPLICATIONS FOR NEGATIVE-ION AND NEUTRAL BEAM TECHNOLOGIES
Authors: PINNADUWAGE LA CHRISTOPHOROU LG
Citation: La. Pinnaduwage et Lg. Christophorou, VERIFICATION OF H- FORMATION IN ULTRAVIOLET-LASER-IRRADIATED HYDROGEN- IMPLICATIONS FOR NEGATIVE-ION AND NEUTRAL BEAM TECHNOLOGIES, Journal of applied physics, 76(1), 1994, pp. 46-54
ENHANCED NEGATIVE-ION FORMATION IN ULTRAVIOLET-LASER IRRADIATED SILANE - IMPLICATIONS FOR PLASMA DEPOSITION OF AMORPHOUS-SILICON
Authors: PINNADUWAGE LA MARTIN MZ CHRISTOPHOROU LG
Citation: La. Pinnaduwage et al., ENHANCED NEGATIVE-ION FORMATION IN ULTRAVIOLET-LASER IRRADIATED SILANE - IMPLICATIONS FOR PLASMA DEPOSITION OF AMORPHOUS-SILICON, Applied physics letters, 65(20), 1994, pp. 2571-2573
TEMPERATURE-ENHANCED ELECTRON DETACHMENT FROM C6F6- NEGATIVE-IONS (VOL 98, PG 7875, 1993)
Authors: DATSKOS PG CHRISTOPHOROU LG CARTER JG
Citation: Pg. Datskos et al., TEMPERATURE-ENHANCED ELECTRON DETACHMENT FROM C6F6- NEGATIVE-IONS (VOL 98, PG 7875, 1993), The Journal of chemical physics, 99(9), 1993, pp. 7279-7279
EFFECT OF TEMPERATURE ON THE ATTACHMENT OF SLOW (LESS-THAN-OR-EQUAL-TO-1 EV) ELECTRONS TO CH3BR (VOL 97, PG 9031, 1992)
Authors: DATSKOS PG CHRISTOPHOROU LG CARTER JG
Citation: Pg. Datskos et al., EFFECT OF TEMPERATURE ON THE ATTACHMENT OF SLOW (LESS-THAN-OR-EQUAL-TO-1 EV) ELECTRONS TO CH3BR (VOL 97, PG 9031, 1992), The Journal of chemical physics, 99(5), 1993, pp. 4238-4238
TEMPERATURE-DEPENDENCE OF ELECTRON-ATTACHMENT AND DETACHMENT IN SF6 AND C-C4F6
Authors: DATSKOS PG CHRISTOPHOROU LG CARTER JG
Citation: Pg. Datskos et al., TEMPERATURE-DEPENDENCE OF ELECTRON-ATTACHMENT AND DETACHMENT IN SF6 AND C-C4F6, The Journal of chemical physics, 99(11), 1993, pp. 8607-8616
TEMPERATURE-ENHANCED ELECTRON DETACHMENT FROM C6F6- NEGATIVE-IONS
Authors: DATSKOS PG CHRISTOPHOROU LG CARTER JG
Citation: Pg. Datskos et al., TEMPERATURE-ENHANCED ELECTRON DETACHMENT FROM C6F6- NEGATIVE-IONS, The Journal of chemical physics, 98(10), 1993, pp. 7875-7882
Risultati: 1-21 |