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Results: 1-25/49
Authors:
LAU WS
PERERA MTC
BABU P
OW AK
HAN T
SANDLER NP
TUNG CH
SHENG TT
CHU PK
Citation: Ws. Lau et al., THE SUPERIORITY OF N2O PLASMA ANNEALING OVER O-2 PLASMA ANNEALING FORAMORPHOUS TANTALUM PENTOXIDE (TA2O5) FILMS, JPN J A P 2, 37(4B), 1998, pp. 435-437
Authors:
CHU PK
GAO YM
ERICKSON JW
Citation: Pk. Chu et al., CHARACTERIZATION OF III-NITRIDE MATERIALS AND DEVICES BY SECONDARY-ION MASS-SPECTROMETRY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(1), 1998, pp. 197-203
Authors:
QIN S
ZHOU YZ
CHAN C
CHU PK
Citation: S. Qin et al., FABRICATION OF LOW DIELECTRIC-CONSTANT MATERIALS FOR ULSI MULTILEVEL INTERCONNECTION BY PLASMA ION-IMPLANTATION, IEEE electron device letters, 19(11), 1998, pp. 420-422
Authors:
KWOK TK
TAM KC
CHU PK
Citation: Tk. Kwok et al., INTERPRETATION OF INPLANE AND OUT-OF-PLANE ANISOTROPIC SURFACE-INTERFACE REFLECTANCE AND TRANSMITTANCE DIFFERENCE SPECTROSCOPY, Journal of the Optical Society of America. B, Optical physics, 15(3), 1998, pp. 1198-1204
Authors:
LU X
IYER SSK
LEE J
DOYLE B
FAN ZN
CHU PK
HU CM
CHEUNG NW
Citation: X. Lu et al., PLASMA IMMERSION ION-IMPLANTATION FOR SOI SYNTHESIS - SIMOX AND ION-CUT, Journal of electronic materials, 27(9), 1998, pp. 1059-1066
Authors:
WANG SY
CHU PK
TANG BY
YAN JC
ZENG XC
Citation: Sy. Wang et al., IMPROVEMENT OF THE WEAR AND CORROSION-RESISTANCE OF OIL PUMP MATERIALS USING PLASMA IMMERSION ION-IMPLANTATION, Surface & coatings technology, 98(1-3), 1998, pp. 897-900
Authors:
TANG BY
CHU PK
WANG SY
CHOW KW
WANG XF
Citation: By. Tang et al., METHANE AND NITROGEN PLASMA IMMERSION ION-IMPLANTATION OF TITANIUM METAL, Surface & coatings technology, 104, 1998, pp. 248-251
Authors:
CHU PK
CHEUNG NW
Citation: Pk. Chu et Nw. Cheung, MICROCAVITY ENGINEERING BY PLASMA IMMERSION ION-IMPLANTATION, Materials chemistry and physics, 57(1), 1998, pp. 1-16
Authors:
CHU PK
CHIA VKF
SMITH SP
MAGEE CW
Citation: Pk. Chu et al., ROUTINE DEPTH PROFILING OF ULTRA-SHALLOW JUNCTIONS BY SECONDARY-ION MASS-SPECTROMETRY, Materials chemistry and physics, 52(1), 1998, pp. 60-65
Authors:
LIU AG
WANG XF
CHEN QC
TANG BY
CHU PK
Citation: Ag. Liu et al., INNER SURFACE ION-IMPLANTATION USING DEFLECTING ELECTRIC-FIELD, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 143(3), 1998, pp. 306-310
Authors:
ZENG XC
KWOK TK
LIU AG
CHU PK
TANG BY
SHERIDAN TE
Citation: Xc. Zeng et al., PLASMA-IMMERSION ION-IMPLANTATION OF THE INTERIOR SURFACE OF A SMALL CYLINDRICAL BORE USING AN AUXILIARY ELECTRODE FOR FINITE RISE-TIME VOLTAGE PULSES, IEEE transactions on plasma science, 26(2), 1998, pp. 175-180
Authors:
CHU PK
QIN S
CHAN C
CHEUNG NW
KO PK
Citation: Pk. Chu et al., INSTRUMENTAL AND PROCESS CONSIDERATIONS FOR THE FABRICATION OF SILICON-ON-INSULATORS (SOI) STRUCTURES BY PLASMA IMMERSION ION-IMPLANTATION, IEEE transactions on plasma science, 26(1), 1998, pp. 79-84
Authors:
LIU AG
WANG XF
TANG BY
CHU PK
KO PK
CHENG YC
Citation: Ag. Liu et al., A NOVEL DISTRIBUTED SYSTEM FOR PLASMA IMMERSION ION IMPLANTER CONTROLAND AUTOMATION, Review of scientific instruments, 69(3), 1998, pp. 1495-1498
Authors:
LIU AG
WANG XF
TANG BY
CHU PK
Citation: Ag. Liu et al., DOSE AND ENERGY UNIFORMITY OVER INNER SURFACE IN PLASMA IMMERSION ION-IMPLANTATION, Journal of applied physics, 84(4), 1998, pp. 1859-1862
Authors:
ZENG XC
KWOK TK
LIU AG
CHU PK
TANG BY
Citation: Xc. Zeng et al., PLASMA IMMERSION ION-IMPLANTATION OF THE INTERIOR SURFACE OF A LARGE CYLINDRICAL BORE USING AN AUXILIARY ELECTRODE, Journal of applied physics, 83(1), 1998, pp. 44-49
Authors:
LAM LM
KWONG CW
HO HP
PUN EYB
CHAN KS
FAN ZN
CHU PK
Citation: Lm. Lam et al., PLASMA IMMERSION AR-IMPLANTATION INDUCED DISORDER IN STRAINED INGAASPMULTIPLE-QUANTUM WELLS( ION), Electronics Letters, 34(8), 1998, pp. 817-818
Authors:
FAN ZN
ZHAO G
CHU PK
JIN ZH
KWOK HS
WONG M
Citation: Zn. Fan et al., FLOATING LOW-TEMPERATURE RADIOFREQUENCY PLASMA OXIDATION OF POLYCRYSTALLINE SILICON-GERMANIUM, Applied physics letters, 73(3), 1998, pp. 360-362
Authors:
FAN ZN
CHU PK
CHAN C
CHEUNG NW
Citation: Zn. Fan et al., SAMPLE STAGE INDUCED DOSE AND ENERGY NONUNIFORMITY IN PLASMA IMMERSION ION-IMPLANTATION OF SILICON, Applied physics letters, 73(2), 1998, pp. 202-204
Authors:
RUVIMOV S
LILIENTALWEBER Z
WASHBURN J
QIAO D
LAU SS
CHU PK
Citation: S. Ruvimov et al., MICROSTRUCTURE OF TI AL OHMIC CONTACTS FOR N-ALGAN/, Applied physics letters, 73(18), 1998, pp. 2582-2584
Authors:
SHERIDAN TE
KWOK TK
CHU PK
Citation: Te. Sheridan et al., KINETIC-MODEL FOR PLASMA-BASED ION-IMPLANTATION OF A SHORT, CYLINDRICAL TUBE WITH AUXILIARY ELECTRODE, Applied physics letters, 72(15), 1998, pp. 1826-1828
Authors:
CHANG RD
CHOI PS
KWONG DL
WRISTERS D
CHU PK
Citation: Rd. Chang et al., BORON SEGREGATION IN AS-IMPLANTED SI CAUSED BY ELECTRIC-FIELD AND TRANSIENT ENHANCED DIFFUSION, Applied physics letters, 72(14), 1998, pp. 1709-1711
Authors:
LAU WS
QIAN PW
SANDLER NP
MCKINLEY KA
CHU PK
Citation: Ws. Lau et al., EVIDENCE THAT N2O IS A STRONGER OXIDIZING-AGENT THAN O-2 FOR THE POSTDEPOSITION ANNEALING OF TA2O5 ON SI CAPACITORS, JPN J A P 1, 36(2), 1997, pp. 661-666
Authors:
CHU PK
SCHUELER BW
REICH F
LINDLEY PM
Citation: Pk. Chu et al., DETERMINATION OF TRACE METALLIC IMPURITIES ON 200-MM SILICON-WAFERS BY TIME-OF-FLIGHT SECONDARY-ION-MASS SPECTROSCOPY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(6), 1997, pp. 1908-1912
Authors:
ZENG XC
LIU AG
KWOK TK
CHU PK
TANG BY
Citation: Xc. Zeng et al., PULSED SHEATH DYNAMICS IN A SMALL CYLINDRICAL BORE WITH AN AUXILIARY ELECTRODE FOR PLASMA IMMERSION ION-IMPLANTATION, Physics of plasmas, 4(12), 1997, pp. 4431-4434
Authors:
WANG SY
CHU PK
TANG BY
ZENG XC
CHEN YB
WANG XF
Citation: Sy. Wang et al., RADIOFREQUENCY PLASMA NITRIDING AND NITROGEN PLASMA IMMERSION ION-IMPLANTATION OF TI-6AL-4V ALLOY, Surface & coatings technology, 93(2-3), 1997, pp. 309-313