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Results: 1-12 |
Results: 12
KINETICS OF BORON ATOMS IN AR-BCL3 FLOWING MICROWAVE DISCHARGES
Authors: PIERSON JF CZERWIEC T BELMONTE T MICHEL H RICARD A
Citation: Jf. Pierson et al., KINETICS OF BORON ATOMS IN AR-BCL3 FLOWING MICROWAVE DISCHARGES, Plasma sources science & technology, 7(1), 1998, pp. 54-60
DIAGNOSTIC OF ARC DISCHARGES FOR PLASMA NITRIDING BY OPTICAL-EMISSIONSPECTROSCOPY
Authors: RENEVIER N CZERWIEC T COLLIGNON P MICHEL H
Citation: N. Renevier et al., DIAGNOSTIC OF ARC DISCHARGES FOR PLASMA NITRIDING BY OPTICAL-EMISSIONSPECTROSCOPY, Surface & coatings technology, 98(1-3), 1998, pp. 1400-1405
DETERMINATION OF O ATOM DENSITY IN AR-O, AND AR-O-2-H-2 FLOWING MICROWAVE DISCHARGES
Authors: CZERWIEC T GAVILLET J BELMONTE T MICHEL H RICARD A
Citation: T. Czerwiec et al., DETERMINATION OF O ATOM DENSITY IN AR-O, AND AR-O-2-H-2 FLOWING MICROWAVE DISCHARGES, Surface & coatings technology, 98(1-3), 1998, pp. 1411-1415
LOW-PRESSURE, HIGH-DENSITY PLASMA NITRIDING - MECHANISMS, TECHNOLOGY AND RESULTS
Authors: CZERWIEC T MICHEL H BERGMANN E
Citation: T. Czerwiec et al., LOW-PRESSURE, HIGH-DENSITY PLASMA NITRIDING - MECHANISMS, TECHNOLOGY AND RESULTS, Surface & coatings technology, 109(1-3), 1998, pp. 182-190
HYDRODYNAMIC AND CHEMICAL MODELING OF A CHEMICAL-VAPOR-DEPOSITION REACTOR FOR ZIRCONIA DEPOSITION
Authors: BELMONTE T GAVILLET J CZERWIEC T ABLITZER D MICHEL H
Citation: T. Belmonte et al., HYDRODYNAMIC AND CHEMICAL MODELING OF A CHEMICAL-VAPOR-DEPOSITION REACTOR FOR ZIRCONIA DEPOSITION, Journal de physique. III, 7(9), 1997, pp. 1779-1796
SYNTHESIS OF ZIRCONIA THIN-FILMS BY RPECVD MODELING OF AR-O-2 POSTDISCHARGE AND COMPARISON BETWEEN AR-O-2 AND AR-O-2-H-2 POSTDISCHARGES PROCESSES
Authors: BELMONTE T CZERWIEC T GAVILLET J MICHEL H
Citation: T. Belmonte et al., SYNTHESIS OF ZIRCONIA THIN-FILMS BY RPECVD MODELING OF AR-O-2 POSTDISCHARGE AND COMPARISON BETWEEN AR-O-2 AND AR-O-2-H-2 POSTDISCHARGES PROCESSES, Surface & coatings technology, 97(1-3), 1997, pp. 642-648
DIAGNOSTIC OF AR-BCL3 MICROWAVE DISCHARGES BY OPTICAL-EMISSION SPECTROSCOPY
Authors: PIERSON JF CZERWIEC T BELMONTE T MICHEL H
Citation: Jf. Pierson et al., DIAGNOSTIC OF AR-BCL3 MICROWAVE DISCHARGES BY OPTICAL-EMISSION SPECTROSCOPY, Surface & coatings technology, 97(1-3), 1997, pp. 749-754
SPUTTERING OF AL-CR AND AL-TI COMPOSITE TARGETS IN PURE AR AND IN REACTIVE AR-N-2 PLASMAS
Authors: SANCHETTE F CZERWIEC T BILLARD A FRANTZ C
Citation: F. Sanchette et al., SPUTTERING OF AL-CR AND AL-TI COMPOSITE TARGETS IN PURE AR AND IN REACTIVE AR-N-2 PLASMAS, Surface & coatings technology, 96(2-3), 1997, pp. 184-190
DETERMINATION OF N AND O ATOM DENSITY IN AR-N-2-H-2 AND AR-O-2-H-2 FLOWING MICROWAVE POST DISCHARGES
Authors: CZERWIEC T GAVILLET J BELMONTE T MICHEL H RICARD A
Citation: T. Czerwiec et al., DETERMINATION OF N AND O ATOM DENSITY IN AR-N-2-H-2 AND AR-O-2-H-2 FLOWING MICROWAVE POST DISCHARGES, Journal de physique. III, 6(9), 1996, pp. 1205-1212
NEW TRENDS ON NITRIDING IN LOW-PRESSURE ARE DISCHARGES STUDIED BY OPTICAL-EMISSION SPECTROSCOPY
Authors: RENEVIER N COLLIGNON P MICHEL H CZERWIEC T
Citation: N. Renevier et al., NEW TRENDS ON NITRIDING IN LOW-PRESSURE ARE DISCHARGES STUDIED BY OPTICAL-EMISSION SPECTROSCOPY, Surface & coatings technology, 87-8(1-3), 1996, pp. 285-291
PROGRESS IN THE ANALYSIS OF THE MECHANISMS OF ION NITRIDING
Authors: MICHEL H CZERWIEC T GANTOIS M ABLITZER D RICARD A
Citation: H. Michel et al., PROGRESS IN THE ANALYSIS OF THE MECHANISMS OF ION NITRIDING, Surface & coatings technology, 72(1-2), 1995, pp. 103-111
CHARACTERIZATION OF A TIN DEPOSITION PROCESS-BASED ON STRUCTURAL STUDIES, PLASMA DIAGNOSTICS AND MATHEMATICAL-MODELING
Authors: CZERWIEC T REMY M MICHEL H
Citation: T. Czerwiec et al., CHARACTERIZATION OF A TIN DEPOSITION PROCESS-BASED ON STRUCTURAL STUDIES, PLASMA DIAGNOSTICS AND MATHEMATICAL-MODELING, Surface & coatings technology, 59(1-3), 1993, pp. 91-96
Risultati: 1-12 |