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Results: 1-17 |
Results: 17

Authors: Campbell, SA Waite, M
Citation: Sa. Campbell et M. Waite, Multistability in coupled Fitzhugh-Nagumo oscillators, NONLIN ANAL, 47(2), 2001, pp. 1093-1104

Authors: Campbell, SA Ma, TZ Smith, R Gladfelter, WL Chen, F
Citation: Sa. Campbell et al., High mobility HfO2 n- and p-channel transistors, MICROEL ENG, 59(1-4), 2001, pp. 361-365

Authors: Ma, TZ Campbell, SA Smith, R Hoilien, N He, BY Gladfelter, WL Hobbs, C Buchanan, D Taylor, C Gribelyuk, M Tiner, M Coppel, M Lee, JJ
Citation: Tz. Ma et al., Group IVB metal oxides high permittivity gate insulators deposited from anhydrous metal nitrates, IEEE DEVICE, 48(10), 2001, pp. 2348-2356

Authors: Smith, RC Ma, TZ Hoilien, N Tsung, LY Bevan, MJ Colombo, L Roberts, J Campbell, SA Gladfelter, WL
Citation: Rc. Smith et al., Chemical vapour deposition of the oxides of titanium, zirconium and hafnium for use as high-k materials in microelectronic devices. A carbon-free precursor for the synthesis of hafnium dioxide, ADV MAT OPT, 10(3-5), 2000, pp. 105-114

Authors: Maclean, J Campbell, SA Pollock, K Chackrewarthy, S Coggins, JR Lapthorn, AJ
Citation: J. Maclean et al., Crystallization and preliminary X-ray analysis of shikimate dehydrogenase from Escherichia coli, ACT CRYST D, 56, 2000, pp. 512-515

Authors: Smith, RC Taylor, CJ Roberts, J Campbell, SA Tiner, M Hegde, R Hobbs, C Gladfelter, WL
Citation: Rc. Smith et al., Observation of precursor control over film stoichiometry during the chemical vapor deposition of amorphous TixSi1-xO2 films, CHEM MATER, 12(10), 2000, pp. 2822

Authors: Nijhawan, S McMurry, PH Campbell, SA
Citation: S. Nijhawan et al., Particle transport in a parallel-plate semiconductor reactor: Chamber modification and design criterion for enhanced process cleanliness, J VAC SCI A, 18(5), 2000, pp. 2198-2206

Authors: Campbell, SA Nishio, JN
Citation: Sa. Campbell et Jn. Nishio, Iron deficiency studies of sugar beet using an improved sodium bicarbonate-buffered hydroponic growth system, J PLANT NUT, 23(6), 2000, pp. 741-757

Authors: Campbell, SA Shirey, RS King, KE Ness, PM
Citation: Sa. Campbell et al., An acute hemolytic transfusion reaction due to anti-IH in a patient with sickle cell disease, TRANSFUSION, 40(7), 2000, pp. 828-831

Authors: Shayer, LP Campbell, SA
Citation: Lp. Shayer et Sa. Campbell, Stability, bifurcation, and multistability in a system of two coupled neurons with multiple time delays, SIAM J A MA, 61(2), 2000, pp. 673-700

Authors: Smith, RC Hoilien, N Taylor, CJ Ma, TZ Campbell, SA Roberts, JT Copel, M Buchanan, DA Gribelyuk, M Gladfelter, WL
Citation: Rc. Smith et al., Low temperature chemical vapor deposition of ZrO2 on Si(100) using anhydrous zirconium(IV) nitrate, J ELCHEM SO, 147(9), 2000, pp. 3472-3476

Authors: Campbell, SA Ruan, SG Wei, JJ
Citation: Sa. Campbell et al., Qualitative analysis of a neural network model with multiple time delays, INT J B CH, 9(8), 1999, pp. 1585-1595

Authors: Kim, HS Campbell, SA Gilmer, DC Kaushik, V Conner, J Prabhu, L Anderson, A
Citation: Hs. Kim et al., Determination of effects of deposition and anneal properties for tetranitratotitanium deposited TiO2 dielectrics, J APPL PHYS, 85(6), 1999, pp. 3278-3281

Authors: Campbell, SA Kim, HS Gilmer, DC He, B Ma, T Gladfelter, WL
Citation: Sa. Campbell et al., Titanium dioxide (TiO2)-based gate insulators, IBM J RES, 43(3), 1999, pp. 383-392

Authors: Campbell, SA Kemerling, AJ Hilderman, RH
Citation: Sa. Campbell et al., Characterization of P-1,P-4-diadenosine 5 '-tetraphosphate binding on bovine aortic endothelial cells, ARCH BIOCH, 364(2), 1999, pp. 280-285

Authors: Taylor, CJ Gilmer, DC Colombo, DG Wilk, GD Campbell, SA Roberts, J Gladfelter, WL
Citation: Cj. Taylor et al., Does chemistry really matter in the chemical vapor deposition of titanium dioxide? Precursor and kinetic effects on the microstructure of polycrystalline films, J AM CHEM S, 121(22), 1999, pp. 5220-5229

Authors: Colombo, DG Gilmer, DC Young, VG Campbell, SA Gladfelter, WL
Citation: Dg. Colombo et al., Anhydrous metal nitrates as volatile single source precursors for the CVD of metal oxide film, CHEM VAPOR, 4(6), 1998, pp. 220
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