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Results:
1-18
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Results: 18
Authors:
Nieto, JP
Caussat, B
Couderc, JP
Orain, I
Jeannerot, L
Citation: Jp. Nieto et al., Atmospheric pressure chemical vapour deposition of BPSG films from TEOS, O-3, TMB, TMPi: Determination of a chemical mechanism, J PHYS IV, 11(PR3), 2001, pp. 149-154
Authors:
Zambov, L
Caussat, B
Boubeker, R
Couderc, JP
Citation: L. Zambov et al., Kinetics of the initial stages of film formation during low pressure chemical vapour deposition of polysilicon by pyrolysis of silane, J PHYS IV, 11(PR3), 2001, pp. 189-196
Authors:
Kouadri-Mostefa, S
Serp, P
Hemati, M
Caussat, B
Citation: S. Kouadri-mostefa et al., Silicon Chemical Vapor Deposition (CVD) on microporous powders in a fluidized bed, POWD TECH, 120(1-2), 2001, pp. 82-87
Authors:
Barathieu, P
Caussat, B
Scheid, E
Jaume, D
Couderc, JP
Citation: P. Barathieu et al., Low-pressure chemical vapor deposition of semi-insulating polycrystalline silicon thin films I. Experimental study and proposal of new kinetic laws, J ELCHEM SO, 148(3), 2001, pp. C149-C155
Authors:
Barathieu, P
Caussat, B
Scheid, E
Couderc, JP
Citation: P. Barathieu et al., Low-pressure chemical vapor deposition of semi-insulating polycrystalline silicon thin films II. Theoretical local analysis of the process, J ELCHEM SO, 148(3), 2001, pp. C156-C161
Authors:
Dollet, A
Caussat, B
Citation: A. Dollet et B. Caussat, Prediction of LPCVD silicon film structure using combined experimental andnumerical analyses, J PHYS IV, 10(P2), 2000, pp. 1-8
Authors:
Ruvalcaba, JRR
Caussat, B
Hemati, M
Couderc, JP
Citation: Jrr. Ruvalcaba et al., Influence of principle operating parameters on chemical vapor deposition of silicon from silane in a fluidized bed to limit agglomeration problems, CAN J CH EN, 78(5), 2000, pp. 955-963
Authors:
Ruvalcaba, JRR
Caussat, B
Hemati, M
Couderc, JP
Citation: Jrr. Ruvalcaba et al., Extension of the fluidized bed silicon CVD process to non-conventional operating conditions - Depositions on porous powders and or under reduced pressure, CHEM ENGN J, 73(1), 1999, pp. 61-66
Authors:
de Mauduit, B
Bourgerette, C
Paillard, V
Puech, P
Caussat, B
Citation: B. De Mauduit et al., Structure of mixed-phase LPCVD silicon films as a function of operating conditions, J PHYS IV, 9(P8), 1999, pp. 1091-1098
Authors:
Temple-Boyer, P
de Mauduit, B
Caussat, B
Couderc, JP
Citation: P. Temple-boyer et al., Correlations between stress and microstructure into LPCVD silicon films, J PHYS IV, 9(P8), 1999, pp. 1107-1114
Authors:
Berjoan, R
Perarnau, D
Caussat, B
Citation: R. Berjoan et al., XPS study of CVD silicon thin films deposited on various substrates from SiH4 gaseous precursor, J PHYS IV, 9(P8), 1999, pp. 1139-1145
Authors:
Nieto, JP
Caussat, B
Couderc, JP
Coletti, S
Jeannerot, L
Citation: Jp. Nieto et al., Modeling of SiO2 deposition from mixtures of tetraethoxysilane and ozone in an APCVD industrial reactor, J PHYS IV, 9(P8), 1999, pp. 149-155
Authors:
Barathieu, P
Caussat, B
Scheid, E
Jaume, D
Couderc, JP
Citation: P. Barathieu et al., Chemical vapor deposition of semi-insulating polycrystalline silicon (SIPOS): Experience and simulation, J PHYS IV, 9(P8), 1999, pp. 173-180
Authors:
Dollet, A
Caussat, B
Couderc, JP
Citation: A. Dollet et al., Prediction of LPCVD silicon film microstructure from local operating conditions using numerical modeling, J PHYS IV, 9(P8), 1999, pp. 181-188
Authors:
Paillard, V
Puech, P
Temple-Boyer, P
Caussat, B
Scheid, E
Couderc, JP
de Mauduit, B
Citation: V. Paillard et al., Improved characterization of polycrystalline silicon film, by resonant Raman scattering, THIN SOL FI, 337(1-2), 1999, pp. 93-97
Authors:
Caussat, B
Hemati, M
Couderc, JP
Citation: B. Caussat et al., Local modeling of mass transfer with chemical reactions in a gas-solid fluidized bed. Application to the chemical vapor deposition of silicon from silanes, POWD TECH, 101(1), 1999, pp. 43-55
Authors:
Ruvalcaba, JRR
Caussat, B
Hemati, M
Couderc, JP
Citation: Jrr. Ruvalcaba et al., Hydrodynamic study of vacuum fluidized beds at high temperature, CAN J CH EN, 77(1), 1999, pp. 35-44
Authors:
Caussat, B
Couderc, JP
Scheid, E
Bourgerette, C
de Mauduit, B
Citation: B. Caussat et al., Influence of substrate nature on the microstructure of LPCVD silicon films, J MAT SCI L, 17(22), 1998, pp. 1899-1901
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