Authors:
Pal, S
Ray, SK
Chakraborty, BR
Lahiri, SK
Bose, DN
Citation: S. Pal et al., Gd2O3, Ga2O3(Gd2O3), Y2O3, and Ga2O3, as high-k gate dielectrics on SiGe: A comparative study, J APPL PHYS, 90(8), 2001, pp. 4103-4107
Authors:
Bhunia, S
Banerji, P
Chaudhuri, TK
Haldar, AR
Bose, DN
Aparna, Y
Chettri, MB
Chakraborty, BR
Citation: S. Bhunia et al., Optimization of growth of InGaAs/InP quantum wells using photoluminescenceand secondary ion mass spectrometry, B MATER SCI, 23(3), 2000, pp. 207-209
Authors:
Bose, DN
Banerji, P
Bhunia, S
Aparna, Y
Chhetri, MB
Chakraborty, BR
Citation: Dn. Bose et al., Determination of well widths in a MOVPE-grown InGaAs/InP multi-quantum well structure using SIMS and photoluminescence, APPL SURF S, 158(1-2), 2000, pp. 16-20
Authors:
Dilawar, N
Varandani, D
Chakraborty, BR
Bandyopadhyay, AK
Citation: N. Dilawar et al., Raman and SIMS studies of rapid thermal annealing effect of silicon ion implanted GaAs, J PHYS CH S, 61(12), 2000, pp. 1927-1933