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Citation: L. Militaru et al., Investigation of deep traps in silicon-germanium epitaxial base bipolar transistors with a single polysilicon quasi self-aligned architecture, MICROEL REL, 41(2), 2001, pp. 253-263
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Citation: S. Jouan et al., Suppression of boron transient-enhanced diffusion in SiGeHBTs by a buried carbon layer, IEEE DEVICE, 48(8), 2001, pp. 1765-1769
Authors:
Niel, S
Chantre, A
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Citation: S. Niel et al., Evaluation of transport properties of ozonized poly/mono interfaces in polysilicon emitter bipolar transistors, SOL ST ELEC, 44(6), 2000, pp. 963-967
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Citation: L. Vendrame et al., Investigation on base-emitter reverse biasing: Light emission, junction cross-talk and hot carriers in single-polysilicon quasi self-aligned bipolar-complementary metal-oxide semiconductor bipolar transistors, JPN J A P 1, 38(8), 1999, pp. 4648-4651
Authors:
Vincent, G
Niel, S
Rozeau, O
Llinares, P
Chantre, A
Citation: G. Vincent et al., Static and dynamic characteristics of a 54 GHz f(max) implanted base 0.35 mu m single-polysilicon bipolar technology, JPN J A P 1, 38(11), 1999, pp. 6258-6263
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Planche, R
Baudry, H
Ribot, P
Chroboczek, JA
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Gloria, D
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Citation: S. Jouan et al., A high-speed low 1/f noise SiGeHBT technology using epitaxially-aligned polysilicon emitters, IEEE DEVICE, 46(7), 1999, pp. 1525-1531