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Results: 1-18 |
Results: 18
A CHEMICAL SENSOR-BASED ON A MICROMECHANICAL CANTILEVER ARRAY FOR THEIDENTIFICATION OF GASES AND VAPORS
Authors: LANG HP BERGER R BATTISTON F RAMSEYER JP MEYER E ANDREOLI C BRUGGER J VETTIGER P DESPONT M MEZZACASA T SCANDELLA L GUNTHERODT HJ GERBER C GIMZEWSKI JK
Citation: Hp. Lang et al., A CHEMICAL SENSOR-BASED ON A MICROMECHANICAL CANTILEVER ARRAY FOR THEIDENTIFICATION OF GASES AND VAPORS, Applied physics A: Materials science & processing, 66, 1998, pp. 61-64
FABRICATION OF PHOTOPLASTIC HIGH-ASPECT-RATIO MICROPARTS AND MICROMOLDS USING SU-8 UV RESIST
Authors: LORENZ H DESPONT M VETTIGER P RENAUD P
Citation: H. Lorenz et al., FABRICATION OF PHOTOPLASTIC HIGH-ASPECT-RATIO MICROPARTS AND MICROMOLDS USING SU-8 UV RESIST, Microsystem technologies, 4(3), 1998, pp. 143-146
2 STEPS MICROMOULDING AND PHOTOPOLYMER HIGH-ASPECT-RATIO STRUCTURING FOR APPLICATIONS IN PIEZOELECTRIC MOTOR COMPONENTS
Authors: DELLMANN L ROTH S BEURET C PARATTE L RACINE GA LORENZ H DESPONT M RENAUD P VETTIGER P DEROOIJ NF
Citation: L. Dellmann et al., 2 STEPS MICROMOULDING AND PHOTOPOLYMER HIGH-ASPECT-RATIO STRUCTURING FOR APPLICATIONS IN PIEZOELECTRIC MOTOR COMPONENTS, Microsystem technologies, 4(3), 1998, pp. 147-150
FABRICATION PROCESS OF HIGH-ASPECT-RATIO ELASTIC AND SU-8 STRUCTURES FOR PIEZOELECTRIC MOTOR APPLICATIONS
Authors: DELLMANN L ROTH S BEURET C RACINE GA LORENZ H DESPONT M RENAUD P VETTIGER P DEROOIJ NF
Citation: L. Dellmann et al., FABRICATION PROCESS OF HIGH-ASPECT-RATIO ELASTIC AND SU-8 STRUCTURES FOR PIEZOELECTRIC MOTOR APPLICATIONS, Sensors and actuators. A, Physical, 70(1-2), 1998, pp. 42-47
LOW-CAST PDMS SEAL RING FOR SINGLE-SIDE WET ETCHING OF MEMS STRUCTURES
Authors: BRUGGER J BELJAKOVIC G DESPONT M BIEBUYCK H DEROOIJ NF VETTIGER P
Citation: J. Brugger et al., LOW-CAST PDMS SEAL RING FOR SINGLE-SIDE WET ETCHING OF MEMS STRUCTURES, Sensors and actuators. A, Physical, 70(1-2), 1998, pp. 191-194
HIGH-ASPECT-RATIO, ULTRATHICK, NEGATIVE-TONE NEAR-UV PHOTORESIST AND ITS APPLICATIONS FOR MEMS
Authors: LORENZ H DESPONT M FAHRNI N BRUGGER J VETTIGER P RENAUD P
Citation: H. Lorenz et al., HIGH-ASPECT-RATIO, ULTRATHICK, NEGATIVE-TONE NEAR-UV PHOTORESIST AND ITS APPLICATIONS FOR MEMS, Sensors and actuators. A, Physical, 64(1), 1998, pp. 33-39
SEQUENTIAL POSITION READOUT FROM ARRAYS OF MICROMECHANICAL CANTILEVERSENSORS
Authors: LANG HP BERGER R ANDREOLI C BRUGGER J DESPONT M VETTIGER P GERBER C GIMZEWSKI JK RAMSEYER JP MEYER E GUNTHERODT HJ
Citation: Hp. Lang et al., SEQUENTIAL POSITION READOUT FROM ARRAYS OF MICROMECHANICAL CANTILEVERSENSORS, Applied physics letters, 72(3), 1998, pp. 383-385
MAKING GOLD NANOSTRUCTURES USING SELF-ASSEMBLED MONOLAYERS AND A SCANNING TUNNELING MICROSCOPE
Authors: DELAMARCHE E HOOLE ACF MICHEL B WILKES S DESPONT M WELLAND ME BIEBUYCK H
Citation: E. Delamarche et al., MAKING GOLD NANOSTRUCTURES USING SELF-ASSEMBLED MONOLAYERS AND A SCANNING TUNNELING MICROSCOPE, JOURNAL OF PHYSICAL CHEMISTRY B, 101(45), 1997, pp. 9263-9269
SU-8 - A LOW-COST NEGATIVE RESIST FOR MEMS
Authors: LORENZ H DESPONT M FAHRNI N LABIANCA N RENAUD P VETTIGER P
Citation: H. Lorenz et al., SU-8 - A LOW-COST NEGATIVE RESIST FOR MEMS, Journal of micromechanics and microengineering, 7(3), 1997, pp. 121-124
SILICON MICRO NANOMECHANICAL DEVICE FABRICATION BASED ON FOCUSED ION-BEAM SURFACE MODIFICATION AND KOH ETCHING/
Authors: BRUGGER J BELJAKOVIC G DESPONT M DEROOIJ NF VETTIGER P
Citation: J. Brugger et al., SILICON MICRO NANOMECHANICAL DEVICE FABRICATION BASED ON FOCUSED ION-BEAM SURFACE MODIFICATION AND KOH ETCHING/, Microelectronic engineering, 35(1-4), 1997, pp. 401-404
FABRICATION OF AN INTEGRATED SILICON-BASED LENS FOR LOW-ENERGY MINIATURIZED ELECTRON COLUMNS
Authors: DESPONT M BELJAKOVIC G STEBLER C STAUFER U VETTIGER P DEROOIJ NF
Citation: M. Despont et al., FABRICATION OF AN INTEGRATED SILICON-BASED LENS FOR LOW-ENERGY MINIATURIZED ELECTRON COLUMNS, JPN J A P 1, 35(12B), 1996, pp. 6641-6647
SECONDARY-ELECTRON IMAGING BY MEANS OF A MICROFABRICATED ELECTRON COLUMN
Authors: STEBLER C DESPONT M STAUFER U
Citation: C. Stebler et al., SECONDARY-ELECTRON IMAGING BY MEANS OF A MICROFABRICATED ELECTRON COLUMN, Journal de physique. III, 6(11), 1996, pp. 1435-1439
FABRICATION OF A SILICON-PYREX-SILICON STACK BY AC ANODIC BONDING
Authors: DESPONT M GROSS H ARROUY F STEBLER C STAUFER U
Citation: M. Despont et al., FABRICATION OF A SILICON-PYREX-SILICON STACK BY AC ANODIC BONDING, Sensors and actuators. A, Physical, 55(2-3), 1996, pp. 219-224
MICROCOLUMN BASED LOW-ENERGY E-BEAM WRITING
Authors: STEBLER C DESPONT M STAUFER U CHANG THP LEE KY RISHTON SA
Citation: C. Stebler et al., MICROCOLUMN BASED LOW-ENERGY E-BEAM WRITING, Microelectronic engineering, 30(1-4), 1996, pp. 45-48
ELECTRON-BEAM MICROCOLUMN FABRICATION AND TESTING
Authors: DESPONT M STAUFER U STEBLER C GROSS H VETTIGER P
Citation: M. Despont et al., ELECTRON-BEAM MICROCOLUMN FABRICATION AND TESTING, Microelectronic engineering, 30(1-4), 1996, pp. 69-72
LOCAL ELECTROCHEMICAL OXIDATION REDUCTION - FIRST STEP TOWARDS A NEW LITHOGRAPHY/
Authors: LOCQUET JP ARROUY F MACHLER E DESPONT M BAUER P WILLIAMS EJ
Citation: Jp. Locquet et al., LOCAL ELECTROCHEMICAL OXIDATION REDUCTION - FIRST STEP TOWARDS A NEW LITHOGRAPHY/, Applied physics letters, 68(14), 1996, pp. 1999-2001
MINIATURIZED E-BEAM WRITER -TESTING OF COMPONENTS
Authors: STEBLER C DESPONT M STAUFER U
Citation: C. Stebler et al., MINIATURIZED E-BEAM WRITER -TESTING OF COMPONENTS, Microelectronic engineering, 27(1-4), 1995, pp. 155-158
MICROFABRICATION OF LENSES FOR A MINIATURIZED ELECTRON COLUMN
Authors: DESPONT M STAUFER U STEBLER C GERMANN R VETTIGER P
Citation: M. Despont et al., MICROFABRICATION OF LENSES FOR A MINIATURIZED ELECTRON COLUMN, Microelectronic engineering, 27(1-4), 1995, pp. 467-470
Risultati: 1-18 |