Authors: WANG QF LAUWERS A DEWEERDT B VERBEECK R LOOSEN F MAEX K

Citation: Qf. Wang et al., A MANUFACTURABLE PROCESS TO IMPROVE THERMAL-STABILITY OF 0.25-MU-M COBALT SILICIDED POLY GATE, IEEE transactions on semiconductor manufacturing, 8(4), 1995, pp. 449-451

Authors: LAUWERS A WANG QF DEWEERDT B MAEX K

Citation: A. Lauwers et al., TI CO BILAYERS IN SALICIDE TECHNOLOGY - ELECTRICAL EVALUATION/, Applied surface science, 91(1-4), 1995, pp. 12-18

Authors: JONCKX F VERBEECK R DEWEERDT B MAEX K

Citation: F. Jonckx et al., ON THE FORMATION OF SILICIDES ON POLY RUNNERS WITH TOPOGRAPHY BY A 2-STEP SILICIDATION PROCESS, Applied surface science, 91(1-4), 1995, pp. 378-381

Authors: SCHREUTELKAMP RJ COPPYE W DEBOSSCHER W VANMEIRHAEGHE R VANMEIRHAEGHE L VANHELLEMONT J DEWEERDT B LAUWERS A MAEX K

Citation: Rj. Schreutelkamp et al., FORMATION OF ULTRATHIN COSI2 FILMS USING A 2-STEP LIMITED REACTION PROCESS, Journal of materials research, 8(12), 1993, pp. 3111-3121

Authors: SCHREUTELKAMP RJ VANDENABEELE P DEWEERDT B VERBEECK R MAEX K

Citation: Rj. Schreutelkamp et al., 2-STEP ANNEALS TO AVOID BRIDGING DURING CO SILICIDATION, Applied surface science, 73, 1993, pp. 162-166