Authors:
Kogler, R
Yankov, RA
Posselt, M
Danilin, AB
Skorupa, W
Citation: R. Kogler et al., Defects remaining in MeV-ion-implanted and annealed Si away from the peak of the nuclear energy deposition profile, NUCL INST B, 147(1-4), 1999, pp. 96-100
Authors:
Bachurin, VI
Churilov, AB
Potapov, EV
Smirnov, VK
Makarov, VV
Danilin, AB
Citation: Vi. Bachurin et al., Formation of thin silicon nitride layers on Si by low energy N-2(+) ion bombardment, NUCL INST B, 147(1-4), 1999, pp. 316-319
Authors:
Belogorokhov, AI
Bublik, VT
Scherbachev, KD
Parkhomenko, YN
Makarov, VV
Danilin, AB
Citation: Ai. Belogorokhov et al., Behaviour of implanted oxygen and nitrogen in halogen lamp annealed silicon, NUCL INST B, 147(1-4), 1999, pp. 320-326