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Results: 1-25 | 26-44 |
Results: 26-44/44
COMB-DRIVE ACTUATORS FOR LARGE DISPLACEMENTS
Authors: LEGTENBERG R GROENEVELD AW ELWENSPOEK M
Citation: R. Legtenberg et al., COMB-DRIVE ACTUATORS FOR LARGE DISPLACEMENTS, Journal of micromechanics and microengineering, 6(3), 1996, pp. 320-329
A SURVEY ON THE REACTIVE ION ETCHING OF SILICON IN MICROTECHNOLOGY
Authors: JANSEN H GARDENIERS H DEBOER M ELWENSPOEK M FLUITMAN J
Citation: H. Jansen et al., A SURVEY ON THE REACTIVE ION ETCHING OF SILICON IN MICROTECHNOLOGY, Journal of micromechanics and microengineering, 6(1), 1996, pp. 14-28
THE MU-FLOWN - A NOVEL DEVICE FOR MEASURING ACOUSTIC FLOWS
Authors: DEBREE HE LEUSSINK P KORTHURST T JANSEN H LAMMERINK TSJ ELWENSPOEK M
Citation: He. Debree et al., THE MU-FLOWN - A NOVEL DEVICE FOR MEASURING ACOUSTIC FLOWS, Sensors and actuators. A, Physical, 54(1-3), 1996, pp. 552-557
SURFACE-MORPHOLOGY OF P-TYPE (100)SILICON ETCHED IN AQUEOUS ALKALINE-SOLUTION
Authors: BRESSERS PMMC KELLY JJ GARDENIERS JGE ELWENSPOEK M
Citation: Pmmc. Bressers et al., SURFACE-MORPHOLOGY OF P-TYPE (100)SILICON ETCHED IN AQUEOUS ALKALINE-SOLUTION, Journal of the Electrochemical Society, 143(5), 1996, pp. 1744-1750
SACRIFICIAL WAFER BONDING FOR PLANARIZATION AFTER VERY DEEP-ETCHING
Authors: SPIERING VL BERENSCHOT JW ELWENSPOEK M FLUITMAN JHJ
Citation: Vl. Spiering et al., SACRIFICIAL WAFER BONDING FOR PLANARIZATION AFTER VERY DEEP-ETCHING, Journal of microelectromechanical systems, 4(3), 1995, pp. 151-157
THE BLACK SILICON METHOD - A UNIVERSAL METHOD FOR DETERMINING THE PARAMETER SETTING OF A FLUORINE-BASED REACTIVE ION ETCHER IN DEEP SILICONTRENCH ETCHING WITH PROFILE CONTROL
Authors: JANSEN H DEBOER M LEGTENBERG R ELWENSPOEK M
Citation: H. Jansen et al., THE BLACK SILICON METHOD - A UNIVERSAL METHOD FOR DETERMINING THE PARAMETER SETTING OF A FLUORINE-BASED REACTIVE ION ETCHER IN DEEP SILICONTRENCH ETCHING WITH PROFILE CONTROL, Journal of micromechanics and microengineering, 5(2), 1995, pp. 115-120
Q-FACTOR DEPENDENCE OF ONE-PORT ENCAPSULATED POLYSILICON RESONATOR ONREACTIVE SEALING PRESSURE
Authors: GUI CQ LEGTENBERG R ELWENSPOEK M FLUITMAN JH
Citation: Cq. Gui et al., Q-FACTOR DEPENDENCE OF ONE-PORT ENCAPSULATED POLYSILICON RESONATOR ONREACTIVE SEALING PRESSURE, Journal of micromechanics and microengineering, 5(2), 1995, pp. 183-185
PLANARIZATION AND FABRICATION OF BRIDGES ACROSS DEEP GROOVES OR HOLESIN SILICON USING A DRY FILM PHOTORESIST FOLLOWED BY AN ETCH BACK
Authors: SPIERING VL BERENSCHOT JW ELWENSPOEK M
Citation: Vl. Spiering et al., PLANARIZATION AND FABRICATION OF BRIDGES ACROSS DEEP GROOVES OR HOLESIN SILICON USING A DRY FILM PHOTORESIST FOLLOWED BY AN ETCH BACK, Journal of micromechanics and microengineering, 5(2), 1995, pp. 189-192
MULTIPARAMETER DETECTION IN FLUID-FLOWS
Authors: VANKUIJK J LAMMERINK TSJ DEBREE HE ELWENSPOEK M FLUITMAN JHJ
Citation: J. Vankuijk et al., MULTIPARAMETER DETECTION IN FLUID-FLOWS, Sensors and actuators. A, Physical, 47(1-3), 1995, pp. 369-372
THE BLACK SILICON METHOD .2. THE EFFECT OF MASK MATERIAL AND LOADING ON THE REACTIVE ION ETCHING OF DEEP SILICON TRENCHES
Authors: JANSEN H DEBOER M BURGER J LEGTENBERG R ELWENSPOEK M
Citation: H. Jansen et al., THE BLACK SILICON METHOD .2. THE EFFECT OF MASK MATERIAL AND LOADING ON THE REACTIVE ION ETCHING OF DEEP SILICON TRENCHES, Microelectronic engineering, 27(1-4), 1995, pp. 475-480
ANISOTROPIC REACTIVE ION ETCHING OF SILICON USING SF6 O-2/CHF3 GAS MIXTURES/
Authors: LEGTENBERG R JANSEN H DEBOER M ELWENSPOEK M
Citation: R. Legtenberg et al., ANISOTROPIC REACTIVE ION ETCHING OF SILICON USING SF6 O-2/CHF3 GAS MIXTURES/, Journal of the Electrochemical Society, 142(6), 1995, pp. 2020-2028
TOWARDS INTEGRATED MICROLIQUID HANDLING SYSTEMS
Authors: ELWENSPOEK M LAMMERINK TSJ MIYAKE R FLUITMAN JHJ
Citation: M. Elwenspoek et al., TOWARDS INTEGRATED MICROLIQUID HANDLING SYSTEMS, Journal of micromechanics and microengineering, 4(4), 1994, pp. 227-245
STICTION OF SURFACE MICROMACHINED STRUCTURES AFTER RINSING AND DRYING- MODEL AND INVESTIGATION OF ADHESION MECHANISMS
Authors: LEGTENBERG R TILMANS HAC ELDERS J ELWENSPOEK M
Citation: R. Legtenberg et al., STICTION OF SURFACE MICROMACHINED STRUCTURES AFTER RINSING AND DRYING- MODEL AND INVESTIGATION OF ADHESION MECHANISMS, Sensors and actuators. A, Physical, 43(1-3), 1994, pp. 230-238
APPLICATIONS OF FLUOROCARBON POLYMERS IN MICROMECHANICS AND MICROMACHINING
Authors: JANSEN HV GARDENIERS JGE ELDERS J TILMANS HAC ELWENSPOEK M
Citation: Hv. Jansen et al., APPLICATIONS OF FLUOROCARBON POLYMERS IN MICROMECHANICS AND MICROMACHINING, Sensors and actuators. A, Physical, 41(1-3), 1994, pp. 136-140
NEW APPLICATIONS OF RF-SPUTTERED GLASS-FILMS AS PROTECTION AND BONDING LAYERS IN SILICON MICROMACHINING
Authors: BERENSCHOT JW GARDENIERS JGE LAMMERINK TSJ ELWENSPOEK M
Citation: Jw. Berenschot et al., NEW APPLICATIONS OF RF-SPUTTERED GLASS-FILMS AS PROTECTION AND BONDING LAYERS IN SILICON MICROMACHINING, Sensors and actuators. A, Physical, 41(1-3), 1994, pp. 338-343
(ELECTRO)MECHANICAL CHARACTERISTICS OF ELECTROSTATICALLY DRIVEN VACUUM ENCAPSULATED POLYSILICON RESONATORS
Authors: TILMANS HAC LEGTENBERG R SCHURER H IJNTEMA DJ ELWENSPOEK M FLUITMAN JHJ
Citation: Hac. Tilmans et al., (ELECTRO)MECHANICAL CHARACTERISTICS OF ELECTROSTATICALLY DRIVEN VACUUM ENCAPSULATED POLYSILICON RESONATORS, IEEE transactions on ultrasonics, ferroelectrics, and frequency control, 41(1), 1994, pp. 4-6
SILICON MICROSTRUCTURES FOR FLUID HANDLING
Authors: ELWENSPOEK M LAMMERINK TSJ MIYAKE R FLUITMAN JHJ
Citation: M. Elwenspoek et al., SILICON MICROSTRUCTURES FOR FLUID HANDLING, Analusis, 22(9), 1994, pp. 130000009-130000012
MICRO-LIQUID FLOW SENSOR
Authors: LAMMERINK TSJ TAS NR ELWENSPOEK M FLUITMAN JHJ
Citation: Tsj. Lammerink et al., MICRO-LIQUID FLOW SENSOR, Sensors and actuators. A, Physical, 37-8, 1993, pp. 45-50
ON THE MECHANISM OF ANISOTROPIC ETCHING OF SILICON
Authors: ELWENSPOEK M
Citation: M. Elwenspoek, ON THE MECHANISM OF ANISOTROPIC ETCHING OF SILICON, Journal of the Electrochemical Society, 140(7), 1993, pp. 2075-2080
Risultati: 1-25 | 26-44 |