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Results: 1-9 |
Results: 9
STENCIL MASK DISTORTION CONTROL USING NONSYMMETRIC PERFORATION RINGS
Authors: SPRAGUE M SEMKE W ENGELSTAD R LOVELL E CHALUPKA A LOSCHNER H STENGL G
Citation: M. Sprague et al., STENCIL MASK DISTORTION CONTROL USING NONSYMMETRIC PERFORATION RINGS, Microelectronic engineering, 42, 1998, pp. 225-228
MECHANICAL MODELING OF ION-BEAM LITHOGRAPHY MASKS
Authors: FISHER A TEJEDA R SPRAGUE M ENGELSTAD R LOVELL E
Citation: A. Fisher et al., MECHANICAL MODELING OF ION-BEAM LITHOGRAPHY MASKS, Microelectronic engineering, 42, 1998, pp. 245-248
X-RAY MASK DISTORTIONS DURING E-BEAM PATTERNING
Authors: SHAMOUN B SPRAGUE M BEDFORD F ENGELSTAD R CERRINA F
Citation: B. Shamoun et al., X-RAY MASK DISTORTIONS DURING E-BEAM PATTERNING, Microelectronic engineering, 42, 1998, pp. 283-286
PREDICTION OF INPLANE DISTORTIONS DUE TO MASK FABRICATION PROCESSES
Authors: LAUDON M FISHER A ENGELSTAD R CERRINA F CUMMINGS K DAUKSHER W RESNICK D JOHNSON W PUISTO D
Citation: M. Laudon et al., PREDICTION OF INPLANE DISTORTIONS DUE TO MASK FABRICATION PROCESSES, Microelectronic engineering, 35(1-4), 1997, pp. 549-552
X-RAY MASK TEMPERATURE DISTRIBUTION AND MAGNIFICATION CONTROL
Authors: DICKS G BEDFORD F ENGELSTAD R CERRINA F
Citation: G. Dicks et al., X-RAY MASK TEMPERATURE DISTRIBUTION AND MAGNIFICATION CONTROL, Microelectronic engineering, 35(1-4), 1997, pp. 561-563
OPTIMIZATION OF THE REFRACTORY X-RAY MASK FABRICATION SEQUENCE
Authors: CUMMINGS KD DAUKSHER WJ JOHNSON WA LAUDON MF ENGELSTAD R
Citation: Kd. Cummings et al., OPTIMIZATION OF THE REFRACTORY X-RAY MASK FABRICATION SEQUENCE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(6), 1996, pp. 4323-4327
PREDICTING OUT-OF-PLANE DISTORTIONS DURING X-RAY MASK FABRICATION
Authors: LAIRD D ENGELSTAD R
Citation: D. Laird et R. Engelstad, PREDICTING OUT-OF-PLANE DISTORTIONS DURING X-RAY MASK FABRICATION, Microelectronic engineering, 30(1-4), 1996, pp. 223-226
MODELING OF INPLANE DISTORTIONS DUE TO VARIATIONS IN ABSORBER STRESS
Authors: LANDON M ENGELSTAD R THOLE K DAUKSHER W RESNICK D CUMMINGS K SEESE P JOHNSON W
Citation: M. Landon et al., MODELING OF INPLANE DISTORTIONS DUE TO VARIATIONS IN ABSORBER STRESS, Microelectronic engineering, 30(1-4), 1996, pp. 227-230
THE EFFECT OF APERTURING ON RADIATION DAMAGE-INDUCED PATTERN DISTORTION OF X-RAY MASKS
Authors: RESNICK DJ CUMMINGS KD DAUKSHER WJ JOHNSON WA SEESE PA CHEN HTH WELLS GM ENGELSTAD R CERRINA F
Citation: Dj. Resnick et al., THE EFFECT OF APERTURING ON RADIATION DAMAGE-INDUCED PATTERN DISTORTION OF X-RAY MASKS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(6), 1995, pp. 3046-3049
Risultati: 1-9 |