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Results:
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Results: 22
Authors:
KLEINSORGE B
ILIE A
CHHOWALLA M
FUKAREK W
MILNE WI
ROBERTSON J
Citation: B. Kleinsorge et al., ELECTRICAL AND OPTICAL-PROPERTIES OF BORONATED TETRAHEDRALLY BONDED AMORPHOUS-CARBON (TA-C-B), DIAMOND AND RELATED MATERIALS, 7(2-5), 1998, pp. 472-476
Authors:
MANOVA D
DIMITROVA V
FUKAREK W
KARPUZOV D
Citation: D. Manova et al., INVESTIGATION OF DC-REACTIVE MAGNETRON-SPUTTERED ALN THIN-FILMS BY ELECTRON-MICROPROBE ANALYSIS, X-RAY PHOTOELECTRON-SPECTROSCOPY AND POLARIZED INFRARED REFLECTION, Surface & coatings technology, 106(2-3), 1998, pp. 205-208
Authors:
FUKAREK W
YANKOV RA
ANWAND W
HEERA V
Citation: W. Fukarek et al., DAMAGE IN SILICON-CARBIDE INDUCED BY RUTHERFORD BACKSCATTERING ANALYSIS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 142(4), 1998, pp. 561-570
Authors:
MOLLER W
FUKAREK W
GRIGULL S
KRUSE O
PARASCANDOLA S
Citation: W. Moller et al., DYNAMIC IN-SITU DIAGNOSTICS USING HIGH-ENERGY ION-BEAM ANALYSIS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 138, 1998, pp. 1203-1211
Authors:
BARTH KL
FUKAREK W
MAUCHER HP
PLASS MF
LUNK A
Citation: Kl. Barth et al., IN-SITU CHARACTERIZATION OF CUBIC BORON-NITRIDE FILM GROWTH IN THE IRSPECTRAL REGION, Thin solid films, 313, 1998, pp. 697-703
Authors:
OBARA K
YIJI P
CHIBA K
FUKAREK W
MOLLER W
Citation: K. Obara et al., SURFACE ELECTRONIC STATES OF ADSORBED NITROGEN MOLECULES ON OXIDIZED NICKEL SURFACE, JPN J A P 1, 36(7B), 1997, pp. 4756-4761
Authors:
PLASS MF
FUKAREK W
KOLITSCH A
MOLLER W
Citation: Mf. Plass et al., GROWTH AND CHARACTERIZATION OF BORON-NITRIDE FILMS - LAYER SEQUENCE AND PHASE IDENTIFICATION, DIAMOND AND RELATED MATERIALS, 6(5-7), 1997, pp. 594-598
Authors:
PLASS MF
FUKAREK W
KOLITSCH A
MOLLER W
Citation: Mf. Plass et al., LAYERED STRUCTURE DIAGNOSTIC AND OPTICAL MODELING OF C-BN FILMS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 127, 1997, pp. 857-860
Authors:
FUKAREK W
MOLLER W
HATZOPOULOS N
ARMOUR DG
VANDENBERG JA
Citation: W. Fukarek et al., ELLIPSOMETRIC INVESTIGATION OF DAMAGE DISTRIBUTION IN LOW-ENERGY BORON IMPLANTATION OF SILICON, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 127, 1997, pp. 879-883
Authors:
FUKAREK W
KRUSE O
KOLITSCH A
MOLLER W
Citation: W. Fukarek et al., INVESTIGATIONS ON THE STRUCTURE OF BORON-NITRIDE FILMS, Thin solid films, 308, 1997, pp. 38-41
Authors:
PLASS MF
FUKAREK W
KOLITSCH A
SCHELL N
MOLLER W
Citation: Mf. Plass et al., LAYERED GROWTH OF BORON-NITRIDE THIN-FILMS, Thin solid films, 305(1-2), 1997, pp. 172-184
Authors:
HEERA V
PROKERT F
SCHELL N
SEIFARTH H
FUKAREK W
VOELSKOW M
SKORUPA W
Citation: V. Heera et al., DENSITY AND STRUCTURAL-CHANGES IN SIC AFTER AMORPHIZATION AND ANNEALING, Applied physics letters, 70(26), 1997, pp. 3531-3533
Authors:
PLASS MF
FUKAREK W
KOLITSCH A
KREISSIG U
Citation: Mf. Plass et al., GROWTH AND CHARACTERIZATION OF BORON-NITRIDE THIN-FILMS, Surface & coatings technology, 84(1-3), 1996, pp. 383-387
Authors:
FUKAREK W
YANKOV RA
SKORUPA W
Citation: W. Fukarek et al., COMPARATIVE-STUDY OF SIMOX STRUCTURES USING 4 ANALYTICAL TECHNIQUES, Surface and interface analysis, 24(4), 1996, pp. 243-251
Authors:
PLASS MF
FUKAREK W
KOLITSCH A
MADER M
MOLLER W
Citation: Mf. Plass et al., EVIDENCE FOR LAYERED STRUCTURE OF BORON-NITRIDE FILMS DETECTED BY RUTHERFORD BACKSCATTERING, Physica status solidi. a, Applied research, 155(2), 1996, pp. 1-4
Authors:
PLASS MF
FUKAREK W
MANDL S
MOLLER W
Citation: Mf. Plass et al., PHASE IDENTIFICATION OF BORON-NITRIDE THIN-FILMS BY POLARIZED INFRARED REFLECTION SPECTROSCOPY, Applied physics letters, 69(1), 1996, pp. 46-48
Authors:
MOLLER W
FUKAREK W
LANGE K
VONKEUDELL A
JACOB W
Citation: W. Moller et al., MECHANISMS OF THE DEPOSITION OF HYDROGENATED CARBON-FILMS, JPN J A P 1, 34(4B), 1995, pp. 2163-2171
Authors:
HATZOPOULOS N
PANKNIN D
FUKAREK W
SKORUPA W
SIAPKAS DI
HEMMENT PLF
Citation: N. Hatzopoulos et al., ELECTRICAL AND OPTICAL CHARACTERIZATION OF DOUBLE SIMOX STRUCTURES FORMED BY SEQUENTIAL HIGH-ENERGY OXYGEN IMPLANTATION INTO SILICON, Microelectronic engineering, 28(1-4), 1995, pp. 415-418
Authors:
FUKAREK W
VONKEUDELL A
Citation: W. Fukarek et A. Vonkeudell, A NOVEL SETUP FOR SPECTROSCOPIC ELLIPSOMETRY USING AN ACOUSTOOPTIC TUNABLE FILTER, Review of scientific instruments, 66(6), 1995, pp. 3545-3550
Authors:
VONKEUDELL A
JACOB W
FUKAREK W
Citation: A. Vonkeudell et al., ROLE OF HYDROGEN-IONS IN PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OFHYDROCARBON FILMS, INVESTIGATED BY IN-SITU ELLIPSOMETRY, Applied physics letters, 66(11), 1995, pp. 1322-1324
Authors:
FUKAREK W
KERSTEN H
Citation: W. Fukarek et H. Kersten, APPLICATION OF DYNAMIC IN-SITU ELLIPSOMETRY TO THE DEPOSITION OF TIN-DOPED INDIUM OXIDE-FILMS BY REACTIVE DIRECT-CURRENT MAGNETRON SPUTTERING, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 12(2), 1994, pp. 523-528
IN-SITU CHARACTERIZATION OF PLASMA-DEPOSITED A-C-H THIN-FILMS BY SPECTROSCOPIC INFRARED ELLIPSOMETRY
Authors:
FRIEDL A
FUKAREK W
MOLLER W
KOCH A
Citation: A. Friedl et al., IN-SITU CHARACTERIZATION OF PLASMA-DEPOSITED A-C-H THIN-FILMS BY SPECTROSCOPIC INFRARED ELLIPSOMETRY, Review of scientific instruments, 65(9), 1994, pp. 2882-2889
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