Citation: G. Ganguly et al., A STUDY OF THE GROWTH-MECHANISM AND PROPERTIES OF MICROCRYSTALLINE SILICON-GERMANIUM, Journal of non-crystalline solids, 230, 1998, pp. 1069-1073
Citation: G. Ganguly et A. Matsuda, A NEW DEPOSITION PARAMETER TO CONTROL THE CARRIER DRIFT MOBILITY IN A-SI-H, Journal of non-crystalline solids, 200, 1996, pp. 1003-1006
Citation: G. Ganguly et al., TIME-OF-FLIGHT MOBILITY MEASUREMENTS IN A-SI-H GROWN UNDER CONTROLLED-ENERGY ION-BOMBARDMENT, Journal of non-crystalline solids, 200, 1996, pp. 300-303
Citation: G. Ganguly et A. Matsuda, ROLE OF HYDROGEN DILUTION IN IMPROVEMENT OF A-SIGE-H ALLOYS, Journal of non-crystalline solids, 200, 1996, pp. 559-562
Authors:
GANGULY G
IKEDA T
NISHIMIYA T
SAITOH K
KONDO M
MATSUDA A
Citation: G. Ganguly et al., HYDROGENATED MICROCRYSTALLINE SILICON-GERMANIUM - A BOTTOM CELL MATERIAL FOR AMORPHOUS SILICON-BASED TANDEM SOLAR-CELLS, Applied physics letters, 69(27), 1996, pp. 4224-4226
Citation: G. Ganguly et al., ABSENCE OF CORRELATION BETWEEN DISORDER AND DEFECT DENSITY IN HYDROGENATED AMORPHOUS-SILICON, JPN J A P 2, 34(3A), 1995, pp. 277-280
Citation: G. Ganguly et A. Dasgupta, RELIABILITY ISSUES IN PLATED-THROUGH-HOLES DUE TO INSERTION-MOUNT COMPLIANT-PIN CONNECTORS, Journal of electronic packaging, 117(2), 1995, pp. 147-152
Citation: A. Matsuda et G. Ganguly, IMPROVEMENT OF HYDROGENATED AMORPHOUS-SILICON GERMANIUM ALLOYS USING LOW-POWER DISILANE-GERMANE DISCHARGES WITHOUT HYDROGEN DILUTION, Applied physics letters, 67(9), 1995, pp. 1274-1276
Citation: Is. Osborne et al., THE EFFECT OF MESH BIAS AND SUBSTRATE BIAS ON THE PROPERTIES OF A-SI-H DEPOSITED BY TRIODE PLASMA CHEMICAL-VAPOR-DEPOSITION, JPN J A P 1, 33(10), 1994, pp. 5663-5667
Citation: A. Suzuki et al., PRECURSOR LIFETIME ESTIMATION BY ULTRAVIOLET-LASER MODULATION OF A HYDROGENATED AMORPHOUS-SILICON GROWTH SURFACE, Applied surface science, 80, 1994, pp. 250-254
Citation: G. Ganguly et A. Matsuda, LIGHT-INDUCED DEFECT DENSITIES IN HYDROGENATED AND DEUTERATED AMORPHOUS-SILICON DEPOSITED AT DIFFERENT SUBSTRATE TEMPERATURES, Physical review. B, Condensed matter, 49(16), 1994, pp. 10986-10990
Citation: Kl. Boyer et al., THE ROBUST SEQUENTIAL ESTIMATOR - A GENERAL-APPROACH AND ITS APPLICATION TO SURFACE ORGANIZATION IN RANGE DATA, IEEE transactions on pattern analysis and machine intelligence, 16(10), 1994, pp. 987-1001
Citation: G. Ganguly et al., REDUCTION OF THE DEFECT DENSITY IN HYDROGENATED AMORPHOUS-SILICON BY THERMALLY ENERGIZED GROWTH PRECURSORS, Applied physics letters, 64(26), 1994, pp. 3581-3583
Citation: G. Ganguly et A. Matsuda, IMPORTANCE OF SURFACE PROCESSES IN DEFECT FORMATION IN A-SI-H, Journal of non-crystalline solids, 166, 1993, pp. 31-36
Citation: A. Suzuki et al., ULTRAVIOLET PHOTON-INDUCED STIMULATION OF SURFACE-REACTION DURING GROWTH OF HYDROGENATED AMORPHOUS-SILICON - ESTIMATION OF THE LIFETIME OF FILM PRECURSORS, Applied physics letters, 63(20), 1993, pp. 2806-2808