AAAAAA

   
Results: 1-9 |
Results: 9
HIGHLY ANISOTROPIC SILICON REACTIVE ION ETCHING FOR NANOFABRICATION USING MIXTURES OF SF6 CHF3 GASES/
Authors: GRIGOROPOULOS S GOGOLIDES E TSEREPI AD NASSIOPOULOS AG
Citation: S. Grigoropoulos et al., HIGHLY ANISOTROPIC SILICON REACTIVE ION ETCHING FOR NANOFABRICATION USING MIXTURES OF SF6 CHF3 GASES/, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 15(3), 1997, pp. 640-645
ELECTROLUMINESCENT SOLID-STATE DEVICES BASED ON SILICON NANOWIRES, FABRICATED BY USING LITHOGRAPHY AND ETCHING TECHNIQUES
Authors: NASSIOPOULOS AG GRIGOROPOULOS S PAPADIMITRIOU D
Citation: Ag. Nassiopoulos et al., ELECTROLUMINESCENT SOLID-STATE DEVICES BASED ON SILICON NANOWIRES, FABRICATED BY USING LITHOGRAPHY AND ETCHING TECHNIQUES, Thin solid films, 297(1-2), 1997, pp. 176-178
WET SILYLATION AND OXYGEN PLASMA DEVELOPMENT OF PHOTORESISTS - A MATURE AND VERSATILE LITHOGRAPHIC PROCESS FOR MICROELECTRONICS AND MICROFABRICATION
Authors: GOGOLIDES E TZEVELEKIS D GRIGOROPOULOS S TEGOU E HATZAKIS M
Citation: E. Gogolides et al., WET SILYLATION AND OXYGEN PLASMA DEVELOPMENT OF PHOTORESISTS - A MATURE AND VERSATILE LITHOGRAPHIC PROCESS FOR MICROELECTRONICS AND MICROFABRICATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(5), 1996, pp. 3332-3338
CHARACTERIZATION OF LIGHT-EMITTING SILICON NANOPILLARS PRODUCED BY LITHOGRAPHY AND ETCHING
Authors: GRIGOROPOULOS S NASSIOPOULOS AG TRAVLOS A PAPADIMITRIOU D KENNOU S LADAS S
Citation: S. Grigoropoulos et al., CHARACTERIZATION OF LIGHT-EMITTING SILICON NANOPILLARS PRODUCED BY LITHOGRAPHY AND ETCHING, Applied surface science, 102, 1996, pp. 377-380
ELECTROLUMINESCENT DEVICE BASED ON SILICON NANOPILLARS
Authors: NASSIOPOULOS AG GRIGOROPOULOS S PAPADIMITRIOU D
Citation: Ag. Nassiopoulos et al., ELECTROLUMINESCENT DEVICE BASED ON SILICON NANOPILLARS, Applied physics letters, 69(15), 1996, pp. 2267-2269
LIGHT-EMISSION FROM SILICON NANOSTRUCTURES PRODUCED BY CONVENTIONAL LITHOGRAPHIC AND REACTIVE ION ETCHING TECHNIQUES
Authors: NASSIOPOULOS AG GRIGOROPOULOS S PAPADIMITRIOU D GOGOLIDES E
Citation: Ag. Nassiopoulos et al., LIGHT-EMISSION FROM SILICON NANOSTRUCTURES PRODUCED BY CONVENTIONAL LITHOGRAPHIC AND REACTIVE ION ETCHING TECHNIQUES, Physica status solidi. b, Basic research, 190(1), 1995, pp. 91-95
HIGHLY ANISOTROPIC ROOM-TEMPERATURE SUB-HALF-MICRON SI REACTIVE ION ETCHING USING FLUORINE ONLY CONTAINING GASES
Authors: GOGOLIDES E GRIGOROPOULOS S NASSIOPOULOS AG
Citation: E. Gogolides et al., HIGHLY ANISOTROPIC ROOM-TEMPERATURE SUB-HALF-MICRON SI REACTIVE ION ETCHING USING FLUORINE ONLY CONTAINING GASES, Microelectronic engineering, 27(1-4), 1995, pp. 449-452
SUBMICROMETER LUMINESCENT POROUS SILICON STRUCTURES USING LITHOGRAPHICALLY PATTERNED SUBSTRATES
Authors: NASSIOPOULOS AG GRIGOROPOULOS S CANHAM L HALIMAOUI A BERBEZIER I GOGOLIDES E PAPADIMITRIOU D
Citation: Ag. Nassiopoulos et al., SUBMICROMETER LUMINESCENT POROUS SILICON STRUCTURES USING LITHOGRAPHICALLY PATTERNED SUBSTRATES, Thin solid films, 255(1-2), 1995, pp. 329-333
VISIBLE LUMINESCENCE FROM ONE-DIMENSIONAL AND 2-DIMENSIONAL SILICON STRUCTURES PRODUCED BY CONVENTIONAL LITHOGRAPHIC AND REACTIVE ION ETCHING TECHNIQUES
Authors: NASSIOPOULOS AG GRIGOROPOULOS S GOGOLIDES E PAPADIMITRIOU D
Citation: Ag. Nassiopoulos et al., VISIBLE LUMINESCENCE FROM ONE-DIMENSIONAL AND 2-DIMENSIONAL SILICON STRUCTURES PRODUCED BY CONVENTIONAL LITHOGRAPHIC AND REACTIVE ION ETCHING TECHNIQUES, Applied physics letters, 66(9), 1995, pp. 1114-1116
Risultati: 1-9 |