Citation: Hm. Marchman et al., NANOMETER-SCALE DIMENSIONAL METROLOGY FOR ADVANCED LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 3585-3590
Citation: Jzy. Guo et al., WAVELENGTH DEPENDENCE OF EXPOSURE WINDOW AND RESIST PROFILE IN X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 12(6), 1994, pp. 4044-4050
Citation: Gj. Chen et al., APPLICATIONS OF FACETED MIRRORS TO X-RAY-LITHOGRAPHY BEAMLINES, Nuclear instruments & methods in physics research. Section A, Accelerators, spectrometers, detectors and associated equipment, 347(1-3), 1994, pp. 238-243
Authors:
GUO JZY
LEONARD Q
CERRINA F
DIFABRIZIO E
LUCIANI L
GENTILI M
FRANK J
Citation: Jzy. Guo et al., EXPERIMENTAL-STUDY OF AERIAL IMAGES IN X-RAY-LITHOGRAPHY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 11(6), 1993, pp. 2902-2905