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Results: 1-15 |
Results: 15
Failure mechanisms of pressurized microchannels, model, and experiments
Authors: Blom, MT Tas, NR Pandraud, G Chmela, E Gardeniers, JGE Tijssen, R Elwenspoek, M van den Berg, A
Citation: Mt. Blom et al., Failure mechanisms of pressurized microchannels, model, and experiments, J MICROEL S, 10(1), 2001, pp. 158-164
Influence of the angle between etched (near) Si{111} surfaces and the substrate orientation on the underetch rate during anisotropic wet-chemical etching of silicon
Authors: Nijdam, AJ Gardeniers, JGE Berenschot, JW van Veenendaal, E van Suchtelen, J Elwenspoek, M
Citation: Aj. Nijdam et al., Influence of the angle between etched (near) Si{111} surfaces and the substrate orientation on the underetch rate during anisotropic wet-chemical etching of silicon, J MICROM M, 11(5), 2001, pp. 499-503
Local anodic bonding of Kovar to Pyrex aimed at high-pressure, solvent-resistant microfluidic connections
Authors: Blom, MT Chmela, E Gardeniers, JGE Berenschot, JW Elwenspoek, M Tijssen, R van den Berg, A
Citation: Mt. Blom et al., Local anodic bonding of Kovar to Pyrex aimed at high-pressure, solvent-resistant microfluidic connections, J MICROM M, 11(4), 2001, pp. 382-385
Formation and stabilization of pyramidal etch hillocks on silicon {100} inanisotropic etchants: Experiments and Monte Carlo simulation
Authors: Nijdam, AJ van Veenendaal, E Cuppen, HM van Suchtelen, J Reed, ML Gardeniers, JGE van Enckevort, WJP Vlieg, E Elwenspoek, M
Citation: Aj. Nijdam et al., Formation and stabilization of pyramidal etch hillocks on silicon {100} inanisotropic etchants: Experiments and Monte Carlo simulation, J APPL PHYS, 89(7), 2001, pp. 4113-4123
Use of selective anodic bonding to create micropump chambers with virtually no dead volume
Authors: Veenstra, TT Berenschot, JW Gardeniers, JGE Sanders, RGP Elwenspoek, MC van den Berg, A
Citation: Tt. Veenstra et al., Use of selective anodic bonding to create micropump chambers with virtually no dead volume, J ELCHEM SO, 148(2), 2001, pp. G68-G72
Multi-walled microchannels: Free-standing porous silicon membranes for usein mu TAS
Authors: Tjerkstra, RW Gardeniers, JGE Kelly, JJ van den Berg, A
Citation: Rw. Tjerkstra et al., Multi-walled microchannels: Free-standing porous silicon membranes for usein mu TAS, J MICROEL S, 9(4), 2000, pp. 495-501
Micromachining of buried micro channels in silicon
Authors: de Boer, MJ Tjerkstra, RW Berenschot, JW Jansen, HV Burger, CJ Gardeniers, JGE Elwenspoek, M van den Berg, A
Citation: Mj. De Boer et al., Micromachining of buried micro channels in silicon, J MICROEL S, 9(1), 2000, pp. 94-103
Etching pits and dislocations in Si{111}
Authors: Nijdam, AJ Gardeniers, JGE Gui, C Elwenspoek, M
Citation: Aj. Nijdam et al., Etching pits and dislocations in Si{111}, SENS ACTU-A, 86(3), 2000, pp. 238-247
Simulation of anisotropic wet chemical etching using a physical model
Authors: van Veenendaal, E Nijdam, AJ van Suchtelen, J Sato, K Gardeniers, JGE van Enckevort, WJP Elwenspoek, M
Citation: E. Van Veenendaal et al., Simulation of anisotropic wet chemical etching using a physical model, SENS ACTU-A, 84(3), 2000, pp. 324-329
The construction of orientation-dependent crystal growth and etch rate functions II: Application to wet chemical etching of silicon in potassium hydroxide
Authors: van Veenendaal, E van Suchtelen, J van Enckevort, WJP Sato, K Nijdam, AJ Gardeniers, JGE Elwenspoek, M
Citation: E. Van Veenendaal et al., The construction of orientation-dependent crystal growth and etch rate functions II: Application to wet chemical etching of silicon in potassium hydroxide, J APPL PHYS, 87(12), 2000, pp. 8732-8740
Si-29-nuclear magnetic resonance on the etching products of silicon in potassium hydroxide solutions
Authors: Nijdam, AJ van Veenendaal, E Gardeniers, JGE Kentgens, APM Nachtegaal, GH Elwenspoek, M
Citation: Aj. Nijdam et al., Si-29-nuclear magnetic resonance on the etching products of silicon in potassium hydroxide solutions, J ELCHEM SO, 147(6), 2000, pp. 2195-2198
Velocity sources as an explanation for experimentally observed variations in Si{111} etch rates
Authors: Nijdam, AJ Berenschot, JW van Suchtelen, J Gardeniers, JGE Elwenspoek, M
Citation: Aj. Nijdam et al., Velocity sources as an explanation for experimentally observed variations in Si{111} etch rates, J MICROM M, 9(2), 1999, pp. 135-138
Fabrication of nanomechanical optical devices with aligned wafer bonding
Authors: Gui, C Veldhuis, GJ Koster, TM Lambeck, PV Berenschot, JW Gardeniers, JGE Elwenspoek, M
Citation: C. Gui et al., Fabrication of nanomechanical optical devices with aligned wafer bonding, MICROSYST T, 5(3), 1999, pp. 138-143
Etching of silicon in alkaline solutions: a critical look at the {1 1 1} minimum
Authors: Nijdam, AJ van Suchtelen, J Berenschot, JW Gardeniers, JGE Elwenspoek, M
Citation: Aj. Nijdam et al., Etching of silicon in alkaline solutions: a critical look at the {1 1 1} minimum, J CRYST GR, 199, 1999, pp. 430-434
The effect of surface roughness on direct wafer bonding
Authors: Gui, C Elwenspoek, M Tas, N Gardeniers, JGE
Citation: C. Gui et al., The effect of surface roughness on direct wafer bonding, J APPL PHYS, 85(10), 1999, pp. 7448-7454
Risultati: 1-15 |