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Results: 1-25/37
Authors:
Yan, M
Bogaerts, A
Gijbels, R
Goedheer, WJ
Citation: M. Yan et al., Kinetic modeling of relaxation phenomena after photodetachment in a rf electronegative SiH4 discharge - art. no. 026405, PHYS REV E, 6302(2), 2001, pp. 6405
Authors:
Lenaerts, J
Verlinden, G
Ignatova, VA
Van Vaeck, L
Gijbels, R
Geuens, I
Citation: J. Lenaerts et al., Modeling of the sputtering process of cubic silver halide microcrystals and its relevance in depth profiling by secondary-ion mass spectrometry (SIMS), FRESEN J AN, 370(5), 2001, pp. 654-662
Authors:
Robben, J
Dufour, D
Gijbels, R
Citation: J. Robben et al., Design and development of a new program for data processing of mass spectra acquired by means of a high-resolution double-focusing glow-discharge mass spectrometer, FRESEN J AN, 370(5), 2001, pp. 663-670
Authors:
Lenaerts, J
Verlinden, G
Van Vaeck, L
Gijbels, R
Geuens, I
Callant, P
Citation: J. Lenaerts et al., Exchange of fluorinated cyanine dyes between different types of silver halide microcrystals studied by imaging time-of-flight secondary ion mass spectrometry, LANGMUIR, 17(23), 2001, pp. 7332-7338
Authors:
Bogaerts, A
Wilken, L
Hoffmann, V
Gijbels, R
Wetzig, K
Citation: A. Bogaerts et al., Comparison of modeling calculations with experimental results for direct current glow discharge optical emission spectrometry, SPECT ACT B, 56(5), 2001, pp. 551-564
Authors:
Bogaerts, A
Gijbels, R
Goedheer, W
Citation: A. Bogaerts et al., Improved hybrid Monte Carlo-fluid model for the electrical characteristicsin an analytical radio-frequency glow discharge in argon, J ANAL ATOM, 16(7), 2001, pp. 750-755
Authors:
Bogaerts, A
Gijbels, R
Citation: A. Bogaerts et R. Gijbels, Modeling of a microsecond pulsed glow discharge: behavior of the argon excited levels and of the sputtered copper atoms and ions, J ANAL ATOM, 16(3), 2001, pp. 239-249
Authors:
Herrebout, D
Bogaerts, A
Yan, M
Gijbels, R
Goedheer, W
Dekempeneer, E
Citation: D. Herrebout et al., One-dimensional fluid model for an rf methane plasma of interest in deposition of diamond-like carbon layers, J APPL PHYS, 90(2), 2001, pp. 570-579
Authors:
De Witte, H
Vandervorst, W
Gijbels, R
Citation: H. De Witte et al., Modeling of bombardment induced oxidation of silicon, J APPL PHYS, 89(5), 2001, pp. 3001-3011
Authors:
Van Vaeck, L
Van Espen, P
Gijbels, R
Baykut, G
Laukien, FH
Citation: L. Van Vaeck et al., A new electrostatic transfer line for improved transmission in Fourier transform laser microprobe mass spectrometry with external ion source, EUR J MASS, 6(3), 2000, pp. 277-287
Authors:
Kaganovich, I
Misina, M
Berezhnoi, SV
Gijbels, R
Citation: I. Kaganovich et al., Electron Boltzmann kinetic equation averaged over fast electron bouncing and pitch-angle scattering for fast modeling of electron cyclotron resonancedischarge, PHYS REV E, 61(2), 2000, pp. 1875-1889
Authors:
Charlier, E
Van Doorselaer, M
Gijbels, R
De Keyzer, R
Geuens, I
Citation: E. Charlier et al., Unveiling the composition of sulfur sensitization specks by their interaction with TAI, J IMAG SC T, 44(3), 2000, pp. 235-241
Authors:
Yan, M
Bogaerts, A
Goedheer, WJ
Gijbels, R
Citation: M. Yan et al., Electron energy distribution function in capacitively coupled RF discharges: difference between electropositive Ar and electronegative SiH4 discharges, PLASMA SOUR, 9(4), 2000, pp. 583-591
Authors:
Bogaerts, A
Gijbels, R
Citation: A. Bogaerts et R. Gijbels, Description of the argon-excited levels in a radio-frequency and direct current glow discharge, SPECT ACT B, 55(3), 2000, pp. 263-278
Authors:
Bogaerts, A
Gijbels, R
Citation: A. Bogaerts et R. Gijbels, Behavior of the sputtered copper atoms, ions and excited species in a radio-frequency and direct current glow discharge, SPECT ACT B, 55(3), 2000, pp. 279-297
Authors:
Bogaerts, A
Gijbels, R
Citation: A. Bogaerts et R. Gijbels, Similarities and differences between direct current and radio-frequency glow discharges: a mathematical simulation, J ANAL ATOM, 15(9), 2000, pp. 1191-1201
Authors:
Bogaerts, A
Gijbels, R
Citation: A. Bogaerts et R. Gijbels, Hybrid Monte Carlo - fluid model for a microsecond pulsed glow discharge, J ANAL ATOM, 15(8), 2000, pp. 895-905
Authors:
Bogaerts, A
Gijbels, R
Citation: A. Bogaerts et R. Gijbels, Effects of adding hydrogen to an argon glow discharge: overview of relevant processes and some qualitative explanations, J ANAL ATOM, 15(4), 2000, pp. 441-449
Authors:
Van Ham, R
Adriaens, A
Van Vaeck, L
Gijbels, R
Adams, F
Citation: R. Van Ham et al., Molecular information in static SIMS for the speciation of inorganic compounds, NUCL INST B, 161, 2000, pp. 245-249
Authors:
De Witte, H
Conard, T
Vandervorst, W
Gijbels, R
Citation: H. De Witte et al., SIMS analysis of oxynitrides: evidence for nitrogen diffusion induced by oxygen flooding, SURF INT AN, 29(11), 2000, pp. 761-765
Authors:
Yan, M
Bogaerts, A
Gijbels, R
Goedheer, WJ
Citation: M. Yan et al., Spatial behavior of energy relaxation of electrons in capacitively coupleddischarges: Comparison between Ar and SiH4, J APPL PHYS, 87(8), 2000, pp. 3628-3636
Authors:
Bogaerts, A
Gijbels, R
Serikov, VV
Citation: A. Bogaerts et al., Calculation of gas heating in direct current argon glow discharges, J APPL PHYS, 87(12), 2000, pp. 8334-8344
Authors:
De Witte, H
De Gendt, S
Douglas, M
Conard, T
Kenis, K
Mertens, PW
Vandervorst, W
Gijbels, R
Citation: H. De Witte et al., Evaluation of time-of-flight secondary ion mass spectrometry for metal contamination monitoring on Si wafer surfaces, J ELCHEM SO, 147(5), 2000, pp. 1915-1919
Authors:
Bogaerts, A
Gijbels, R
Goedheer, W
Citation: A. Bogaerts et al., Hybrid modeling of a capacitively coupled radio frequency glow discharge in argon: Combined Monte Carlo and fluid model, JPN J A P 1, 38(7B), 1999, pp. 4404-4415
Authors:
Verlinden, G
Gijbels, R
Geuens, I
Citation: G. Verlinden et al., Quantitative secondary ion mass spectrometry depth profiling of surface layers of cubic silver halide microcrystals, J AM SOC M, 10(10), 1999, pp. 1016-1027