Citation: I. Safi et al., THE PROPERTIES OF REACTIVELY SPUTTERED, STOICHIOMETRY-CONTROLLED AND OPTIMUM-CONDUCTIVITY TRANSPARENT ZINC ALUMINIUM OXIDE-FILMS AS A FUNCTION OF THEIR ALUMINUM CONTENT/, Surface & coatings technology, 99(1-2), 1998, pp. 33-41
Citation: N. Danson et al., TECHNIQUES FOR THE SPUTTERING OF OPTIMUM INDIUM-TIN OXIDE-FILMS ON TOROOM-TEMPERATURE SUBSTRATES, Surface & coatings technology, 99(1-2), 1998, pp. 147-160
Authors:
QIN W
HOWSON RP
AKIZUKI M
MATSUO J
TAKAOKA G
YAMADA I
Citation: W. Qin et al., INDIUM OXIDE FILM FORMATION BY O-2 CLUSTER ION-ASSISTED DEPOSITION, Materials chemistry and physics, 54(1-3), 1998, pp. 258-261
Citation: N. Mustapha et Rp. Howson, COMPARISON OF UNBALANCED MAGNETRON SPUTTERING AND FILTERED ARE EVAPORATION FOR THE PREPARATION OF FILMS ONTO INSULATING SUBSTRATES, Vacuum, 49(2), 1998, pp. 75-79
Citation: Rp. Howson, SYNTHESIS OF SPUTTERED THIN-FILMS IN LOW-ENERGY ION-BEAMS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 121(1-4), 1997, pp. 65-72
Citation: Rp. Howson et al., REACTIVE MAGNETRON SPUTTERING OF SILICON TO PRODUCE SILICON-OXIDE, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 121(1-4), 1997, pp. 90-95
Citation: Rp. Howson et al., SPUTTERING OF INDIUM-TIN OXIDE, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 121(1-4), 1997, pp. 96-101
Citation: N. Danson et al., IMPROVED CONTROL TECHNIQUES FOR THE REACTIVE MAGNETRON SPUTTERING OF SILICON TO PRODUCE SILICON-OXIDE AND THE IMPLICATIONS FOR SELECTED FILM PROPERTIES, Thin solid films, 289(1-2), 1996, pp. 99-106
Authors:
TOMINAGA K
INOUE S
HOWSON RP
KUSAKA K
HANABUSA T
Citation: K. Tominaga et al., TIN FILMS PREPARED BY UNBALANCED PLANAR MAGNETRON SPUTTERING UNDER CONTROL OF PHOTOEMISSION OF TI, Thin solid films, 282(1-2), 1996, pp. 182-185
Citation: S. Inoue et al., EFFECTS OF NITROGEN PRESSURE AND ION FLUX ON THE PROPERTIES OF DIRECT-CURRENT REACTIVE MAGNETRON-SPUTTERED ZR-N FILMS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(6), 1995, pp. 2808-2813
Authors:
INOUE S
UCHIDA H
HIOKI A
KOTERAZAWA K
HOWSON RP
Citation: S. Inoue et al., STRUCTURE AND COMPOSITION OF (TI,AL)N FILMS PREPARED BY RF PLANAR MAGNETRON SPUTTERING USING A COMPOSITE TARGET, Thin solid films, 271(1-2), 1995, pp. 15-18
Authors:
INOUE S
UCIHDA H
TAKESHITA K
KOTERASAWA K
HOWSON RP
Citation: S. Inoue et al., PREPARATION OF COMPOSITIONALLY GRADIENT TI-TIN FILMS BY RF REACTIVE SPUTTERING, Thin solid films, 261(1-2), 1995, pp. 115-119