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Results:
1-16
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Results: 16
Authors:
SAFI I
DANSON N
HOWSON RP
Citation: I. Safi et al., THE PROPERTIES OF REACTIVELY SPUTTERED, STOICHIOMETRY-CONTROLLED AND OPTIMUM-CONDUCTIVITY TRANSPARENT ZINC ALUMINIUM OXIDE-FILMS AS A FUNCTION OF THEIR ALUMINUM CONTENT/, Surface & coatings technology, 99(1-2), 1998, pp. 33-41
Authors:
DANSON N
SAFI I
HALL GW
HOWSON RP
Citation: N. Danson et al., TECHNIQUES FOR THE SPUTTERING OF OPTIMUM INDIUM-TIN OXIDE-FILMS ON TOROOM-TEMPERATURE SUBSTRATES, Surface & coatings technology, 99(1-2), 1998, pp. 147-160
Authors:
QIN W
HOWSON RP
AKIZUKI M
MATSUO J
TAKAOKA G
YAMADA I
Citation: W. Qin et al., INDIUM OXIDE FILM FORMATION BY O-2 CLUSTER ION-ASSISTED DEPOSITION, Materials chemistry and physics, 54(1-3), 1998, pp. 258-261
Authors:
MUSTAPHA N
HOWSON RP
Citation: N. Mustapha et Rp. Howson, COMPARISON OF UNBALANCED MAGNETRON SPUTTERING AND FILTERED ARE EVAPORATION FOR THE PREPARATION OF FILMS ONTO INSULATING SUBSTRATES, Vacuum, 49(2), 1998, pp. 75-79
Authors:
MUSTAPHA N
HOWSON RP
Citation: N. Mustapha et Rp. Howson, OPTICAL TIN FILMS BY FILTERED ARC EVAPORATION, Surface & coatings technology, 92(1-2), 1997, pp. 29-33
Authors:
HOWSON RP
Citation: Rp. Howson, SYNTHESIS OF SPUTTERED THIN-FILMS IN LOW-ENERGY ION-BEAMS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 121(1-4), 1997, pp. 65-72
Authors:
HOWSON RP
DANSON N
HALL GW
Citation: Rp. Howson et al., REACTIVE MAGNETRON SPUTTERING OF SILICON TO PRODUCE SILICON-OXIDE, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 121(1-4), 1997, pp. 90-95
Authors:
HOWSON RP
SAFI I
HALL GW
DANSON N
Citation: Rp. Howson et al., SPUTTERING OF INDIUM-TIN OXIDE, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 121(1-4), 1997, pp. 96-101
Authors:
BIEDERMAN H
HOWSON RP
SLAVINSKA D
STUNDZIA V
ZEMEK J
Citation: H. Biederman et al., COMPOSITE METAL C-H FILMS PREPARED IN AN UNBALANCED MAGNETRON/, Vacuum, 48(10), 1997, pp. 883-886
Authors:
BIEDERMAN H
HLIDEK P
PESICKA J
SLAVINSKA D
STUNDZIA V
ZEMEK J
KINGDON RJ
HOWSON RP
Citation: H. Biederman et al., COMPOSITE METAL C-H FILMS PREPARED BY UNBALANCED MAGNETRON SPUTTERING- NI/C-H/, Vacuum, 47(12), 1996, pp. 1453-1463
Authors:
DANSON N
HALL GW
HOWSON RP
Citation: N. Danson et al., IMPROVED CONTROL TECHNIQUES FOR THE REACTIVE MAGNETRON SPUTTERING OF SILICON TO PRODUCE SILICON-OXIDE AND THE IMPLICATIONS FOR SELECTED FILM PROPERTIES, Thin solid films, 289(1-2), 1996, pp. 99-106
Authors:
TOMINAGA K
INOUE S
HOWSON RP
KUSAKA K
HANABUSA T
Citation: K. Tominaga et al., TIN FILMS PREPARED BY UNBALANCED PLANAR MAGNETRON SPUTTERING UNDER CONTROL OF PHOTOEMISSION OF TI, Thin solid films, 282(1-2), 1996, pp. 182-185
Authors:
INOUE S
TOMINAGA K
HOWSON RP
KUSAKA K
Citation: S. Inoue et al., EFFECTS OF NITROGEN PRESSURE AND ION FLUX ON THE PROPERTIES OF DIRECT-CURRENT REACTIVE MAGNETRON-SPUTTERED ZR-N FILMS, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 13(6), 1995, pp. 2808-2813
Authors:
INOUE S
UCHIDA H
HIOKI A
KOTERAZAWA K
HOWSON RP
Citation: S. Inoue et al., STRUCTURE AND COMPOSITION OF (TI,AL)N FILMS PREPARED BY RF PLANAR MAGNETRON SPUTTERING USING A COMPOSITE TARGET, Thin solid films, 271(1-2), 1995, pp. 15-18
Authors:
INOUE S
UCIHDA H
TAKESHITA K
KOTERASAWA K
HOWSON RP
Citation: S. Inoue et al., PREPARATION OF COMPOSITIONALLY GRADIENT TI-TIN FILMS BY RF REACTIVE SPUTTERING, Thin solid films, 261(1-2), 1995, pp. 115-119
Authors:
HOWSON RP
Citation: Rp. Howson, THE REACTIVE SPUTTERING OF OXIDES AND NITRIDES, Pure and applied chemistry, 66(6), 1994, pp. 1311-1318
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1-16
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