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Results:
1-4
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Results: 4
Process stability of ferroelectric PLZT thin film sputtering for FRAM (R) production
Authors:
Suu, K Tani, N Chu, F Hickert, G Hadnagy, TD Davenport, T
Citation:
K. Suu et al., Process stability of ferroelectric PLZT thin film sputtering for FRAM (R) production, INTEGR FERR, 26(1-4), 1999, pp. 711-721
SBTN thin film capacitors prepared by RF-magnetron sputtering
Authors:
Sun, S Fox, GR Hadnagy, TD
Citation:
S. Sun et al., SBTN thin film capacitors prepared by RF-magnetron sputtering, INTEGR FERR, 26(1-4), 1999, pp. 733-739
Ferroelectric properties of PLZT thin films prepared using ULVAC ZX-1000 sputtering system
Authors:
Chu, F Hickert, G Hadnagy, TD Suu, KK
Citation:
F. Chu et al., Ferroelectric properties of PLZT thin films prepared using ULVAC ZX-1000 sputtering system, INTEGR FERR, 26(1-4), 1999, pp. 749-757
Comparison of CSD and sputtered PZT with iridium electrodes
Authors:
Fox, GR Sun, S Eastep, B Hadnagy, TD
Citation:
Gr. Fox et al., Comparison of CSD and sputtered PZT with iridium electrodes, INTEGR FERR, 26(1-4), 1999, pp. 917-925
Risultati:
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