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Results:
1-12
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Results: 12
Authors:
Grossmann, M
Lohse, O
Bolten, D
Boettger, U
Waser, R
Tiedke, S
Schmitz, T
Kall, U
Kastner, M
Schindler, G
Hartner, W
Citation: M. Grossmann et al., Influence of the measurement parameters on the reliability of ferroelectric thin films, INTEGR FERR, 32(1-4), 2001, pp. 693-701
Authors:
Bachhofer, H
von Philipsborn, H
Hartner, W
Dehm, C
Jobst, B
Kiendl, A
Schroeder, H
Waser, R
Citation: H. Bachhofer et al., Phase formation and crystal growth of Sr-Bi-Ta-O thin films grown by metalorganic chemical vapor deposition, J MATER RES, 16(10), 2001, pp. 2966-2973
Authors:
Mikolajick, T
Dehm, C
Hartner, W
Kasko, I
Kastner, MJ
Nagel, N
Moert, M
Mazure, C
Citation: T. Mikolajick et al., FeRAM technology for high density applications, MICROEL REL, 41(7), 2001, pp. 947-950
Authors:
Aspelmeyer, M
Klemradt, U
Hartner, W
Bachhofer, H
Schindler, G
Citation: M. Aspelmeyer et al., High-resolution x-ray reflectivity study of thin layered Pt-electrodes forintegrated ferroelectric devices, J PHYS D, 34(10A), 2001, pp. A173-A178
Authors:
Hartner, W
Schindler, G
Bosk, P
Gabric, Z
Kastner, M
Beitel, G
Mikolajick, T
Dehm, C
Mazure, C
Citation: W. Hartner et al., Integration of H-2 barriers for ferroelectric memories based on SrBi2Ta2O9(SBT), INTEGR FERR, 31(1-4), 2000, pp. 273-284
Degradation mechanisms of SrBi2Ta2O9 ferroelectric thin film capacitors during forming gas annealing
Authors:
Hartner, W
Bosk, P
Schindler, G
Schroeder, H
Waser, R
Dehm, C
Mazure, C
Citation: W. Hartner et al., Degradation mechanisms of SrBi2Ta2O9 ferroelectric thin film capacitors during forming gas annealing, INTEGR FERR, 31(1-4), 2000, pp. 341-350
Authors:
Mort, M
Schindler, G
Hartner, W
Kasko, I
Kastner, MJ
Mikolajick, T
Dehm, C
Waser, R
Citation: M. Mort et al., Low temperature process and thin SBT films for ferroelectric memory devices, INTEGR FERR, 30(1-4), 2000, pp. 235-244
Authors:
Landau, SA
Junghans, N
Weiss, PA
Kolbesen, BO
Olbrich, A
Schindler, G
Hartner, W
Hintermaier, F
Dehm, C
Mazure, C
Citation: Sa. Landau et al., Scanning probe microscopy - a tool for the investigation of high-k materials, APPL SURF S, 157(4), 2000, pp. 387-392
Authors:
Grossmann, M
Lohse, O
Bolten, D
Boettger, U
Waser, R
Hartner, W
Kastner, M
Schindler, G
Citation: M. Grossmann et al., Lifetime estimation due to imprint failure in ferroelectric SrBi2Ta2O9 thin films, APPL PHYS L, 76(3), 2000, pp. 363-365
Authors:
Hartner, W
Schindler, G
Weinrich, V
Ahlstedt, M
Schroeder, H
Waser, R
Dehm, C
Mazure, C
Citation: W. Hartner et al., Influence of dry etching using argon on structural and electrical properties of crystalline and non-crystalline SrBi2Ta2O9 thin films, INTEGR FERR, 27(1-4), 1999, pp. 1257-1269
Authors:
Dehm, C
Hartner, W
Schindler, G
Bergmann, R
Hasler, B
Kasko, I
Kastner, M
Schiele, M
Weinrich, V
Mazure, C
Citation: C. Dehm et al., Review of SrBi2Ta2O9 thin films capacitor processing, INTEGR FERR, 26(1-4), 1999, pp. 899-915
Authors:
Engelhardt, M
Weinrich, V
Nagel, N
Hartner, W
Citation: M. Engelhardt et al., Challenges in plasma etching and patterning for fabrication of new systemsand devices, J VAC SCI A, 17(4), 1999, pp. 1536-1538
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