Authors:
Aspar, B
Moriceau, H
Jalaguier, E
Lagahe, C
Soubie, A
Biasse, B
Papon, AM
Claverie, A
Grisolia, J
Benassayag, G
Letertre, F
Rayssac, O
Barge, T
Maleville, C
Ghyselen, B
Citation: B. Aspar et al., The generic nature of the Smart-Cut((R)) process for thin film transfer, J ELEC MAT, 30(7), 2001, pp. 834-840
Authors:
Monat, C
Seassal, C
Letartre, X
Viktorovitch, P
Regreny, P
Gendry, M
Rojo-Romeo, P
Hollinger, G
Jalaguier, E
Pocas, S
Aspar, B
Citation: C. Monat et al., InP 2D photonic crystal microlasers on silicon wafer: room temperature operation at 1.55 mu m, ELECTR LETT, 37(12), 2001, pp. 764-766
Authors:
Aspar, B
Jalaguier, E
Mas, A
Locatelli, C
Rayssac, O
Moriceau, H
Pocas, S
Papon, AM
Michaud, JF
Bruel, M
Citation: B. Aspar et al., Smart-Cut (R) process using metallic bonding: Application to transfer of Si, GaAs, InP thin films, ELECTR LETT, 35(12), 1999, pp. 1024-1025