Citation: J. Itoh et al., 3-DIMENSIONAL VACUUM MAGNETIC SENSOR WITH A SI EMITTER TIP, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(3), 1998, pp. 1233-1235
Authors:
ISHII K
SUZUKI E
KANEMARU S
MAEDA T
NAGAI K
SEKIGAWA T
Citation: K. Ishii et al., SUPPRESSED THRESHOLD VOLTAGE ROLL-OFF CHARACTERISTIC OF 40NM GATE LENGTH ULTRATHIN SOI MOSFET, Electronics Letters, 34(21), 1998, pp. 2069-2070
Authors:
KANEMARU S
OZAWA K
EHARA K
HIRANO T
TANOUE H
ITOH J
Citation: S. Kanemaru et al., FABRICATION OF METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT-TRANSISTOR-STRUCTURED SILICON FIELD EMITTERS WITH A POLYSILICON DUAL-GATE, JPN J A P 1, 36(12B), 1997, pp. 7736-7740
Authors:
HOBARA Y
KANEMARU S
HAYAKAWA M
GURNETT DA
Citation: Y. Hobara et al., ON ESTIMATING THE AMPLITUDE OF JOVIAN WHISTLERS OBSERVED BY VOYAGER-1AND IMPLICATIONS CONCERNING LIGHTNING, J GEO R-S P, 102(A4), 1997, pp. 7115-7125
Authors:
KANEMARU S
FUKUSHIMA H
NAKAMURA H
TAMAKI H
FUKUYAMA Y
TAMURA Y
Citation: S. Kanemaru et al., ALPHA-INTERFERON FOR THE TREATMENT OF IDIOPATHIC SUDDEN SENSORINEURALHEARING-LOSS, European archives of oto-rhino-laryngology, 254(3), 1997, pp. 158-162
Citation: S. Kanemaru et al., CONTROL OF EMISSION CURRENTS FROM SILICON FIELD EMITTER ARRAYS USING A BUILT-IN MOSFET, Applied surface science, 111, 1997, pp. 218-223
Citation: C. Py et al., BEAM FOCUSING CHARACTERISTICS OF SILICON MICROTIPS WITH AN INPLANE LENS, I.E.E.E. transactions on electron devices, 44(3), 1997, pp. 498-502
Citation: T. Hirano et al., FABRICATION OF A NEW SI FIELD EMITTER TIP WITH METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR (MOSFET) STRUCTURE, JPN J A P 1, 35(12B), 1996, pp. 6637-6640
Citation: T. Hirano et al., A NEW METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT-TRANSISTOR-STRUCTURED SIFIELD EMITTER TIP, JPN J A P 2, 35(7A), 1996, pp. 861-863
Citation: T. Hirano et al., EMISSION CURRENT SATURATION OF THE P-TYPE SILICON GATED FIELD EMITTERARRAY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(5), 1996, pp. 3357-3360
Citation: S. Kanemaru et al., CONTROL OF EMISSION CHARACTERISTICS OF SILICON FIELD EMITTER ARRAYS BY AN ION-IMPLANTATION TECHNIQUE, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(3), 1996, pp. 1885-1888
Citation: Y. Toma et al., ELECTRON-BEAM CHARACTERISTICS OF DOUBLE-GATED SI FIELD EMITTER ARRAYS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(3), 1996, pp. 1902-1905
Authors:
ITOH J
NAZUKA Y
KANEMARU S
INOUE T
YOKOYAMA H
SHIMIZU K
Citation: J. Itoh et al., MICROSCOPIC CHARACTERIZATION OF FIELD EMITTER ARRAY STRUCTURE AND WORK FUNCTION BY SCANNING MAXWELL-STRESS MICROSCOPY, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(3), 1996, pp. 2105-2109
Citation: J. Itoh et al., ULTRASTABLE EMISSION FROM A METAL-OXIDE-SEMICONDUCTOR FIELD-EFFECT TRANSISTOR-STRUCTURED SI EMITTER TIP, Applied physics letters, 69(11), 1996, pp. 1577-1578
Authors:
ITOH J
NAZUKA Y
INOUE T
YOKOYAMA H
KANEMARU S
SHIMIZU K
Citation: J. Itoh et al., NANOSCALE EVALUATION OF STRUCTURE AND SURFACE-POTENTIAL OF GATED FIELD EMITTERS BY SCANNING MAXWELL-STRESS MICROSCOPE, JPN J A P 1, 34(12B), 1995, pp. 6912-6915
Authors:
YAMAOKA Y
GOTO T
NAKAO M
KANEMARU S
ITOH J
Citation: Y. Yamaoka et al., FABRICATION OF SILICON FIELD EMITTER ARRAYS WITH O.1-MU-M-DIAMETER GATE BY FOCUSED ION-BEAM LITHOGRAPHY, JPN J A P 1, 34(12B), 1995, pp. 6932-6934
Authors:
ITOH J
TOHMA Y
MORIKAWA K
KANEMARU S
SHIMIZU K
Citation: J. Itoh et al., FABRICATION OF DOUBLE-GATED SI FIELD EMITTER ARRAYS FOR FOCUSED ELECTRON-BEAM GENERATION, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 13(5), 1995, pp. 1968-1972