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Results: 1-9 |
Results: 9
VORTEX ARRAYS IN THE BSCCO(2212) SINGLE-CRYSTALS IN THE VICINITY OF STEPS ON THE SAMPLE SURFACE
Authors: VINNIKOV LY BARKOV TL IRMER B KRAGLER K SAEMANNISCHENKO G
Citation: Ly. Vinnikov et al., VORTEX ARRAYS IN THE BSCCO(2212) SINGLE-CRYSTALS IN THE VICINITY OF STEPS ON THE SAMPLE SURFACE, Physica. C, Superconductivity, 308(1-2), 1998, pp. 99-104
LOW-VOLTAGE ELECTRON-BEAM LITHOGRAPHY WITH SCANNING-TUNNELING-MICROSCOPY IN AIR - A NEW METHOD FOR PRODUCING STRUCTURES WITH HIGH ASPECT RATIOS
Authors: KRAGLER K GUNTHER E LEUSCHNER R FALK G VONSEGGERN H SAEMANNISCHENKO G
Citation: K. Kragler et al., LOW-VOLTAGE ELECTRON-BEAM LITHOGRAPHY WITH SCANNING-TUNNELING-MICROSCOPY IN AIR - A NEW METHOD FOR PRODUCING STRUCTURES WITH HIGH ASPECT RATIOS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 14(2), 1996, pp. 1327-1330
XPS STUDY OF THE EFFECTS OF 30-MEV S-32-ION IRRADIATION AT T=20-K ON LN(2-X)CE(X)CUO(4-DELTA)-CUPRATES
Authors: NIEPEL A FINK C KRAGLER K
Citation: A. Niepel et al., XPS STUDY OF THE EFFECTS OF 30-MEV S-32-ION IRRADIATION AT T=20-K ON LN(2-X)CE(X)CUO(4-DELTA)-CUPRATES, Physica. C, Superconductivity, 265(1-2), 1996, pp. 19-25
NANOTECHNOLOGY AND SURFACE-ANALYSIS USING SCANNING PROBE MICROSCOPY
Authors: GUNTHER E KRAGLER K
Citation: E. Gunther et K. Kragler, NANOTECHNOLOGY AND SURFACE-ANALYSIS USING SCANNING PROBE MICROSCOPY, Siemens Review, 1996, pp. 2-4
MEV CLUSTER ION-INDUCED DEFECT PRODUCTION IN HIGH T-C SUPERCONDUCTORS
Authors: TOMASCHKO C SCHOPPMANN C KRAUS M KRAGLER K KREISELMEYER G SAEMANNISCHENKO G VOIT H BRUNELLE A DELLANEGRA S LEBEYEC Y
Citation: C. Tomaschko et al., MEV CLUSTER ION-INDUCED DEFECT PRODUCTION IN HIGH T-C SUPERCONDUCTORS, Nuclear instruments & methods in physics research. Section B, Beam interactions with materials and atoms, 117(1-2), 1996, pp. 90-94
BILAYER RESIST PROCESS FOR EXPOSURE WITH LOW-VOLTAGE ELECTRONS (STM-LITHOGRAPHY)
Authors: LEUSCHNER R GUNTHER E FALK G HAMMERSCHMIDT A KRAGLER K RANGELOW IW ZIMMERMANN J
Citation: R. Leuschner et al., BILAYER RESIST PROCESS FOR EXPOSURE WITH LOW-VOLTAGE ELECTRONS (STM-LITHOGRAPHY), Microelectronic engineering, 30(1-4), 1996, pp. 447-450
PATTERNING OF AN ELECTRON-BEAM RESIST WITH A SCANNING TUNNELING MICROSCOPE OPERATING IN AIR
Authors: KRAGLER K GUNTHER E LEUSCHNER R FALK G VONSEGGERN H SAEMANNISCHENKO G
Citation: K. Kragler et al., PATTERNING OF AN ELECTRON-BEAM RESIST WITH A SCANNING TUNNELING MICROSCOPE OPERATING IN AIR, Thin solid films, 264(2), 1995, pp. 259-263
SCANNING-TUNNELING-MICROSCOPY BASED LITHOGRAPHY EMPLOYING AMORPHOUS HYDROGENATED CARBON AS A HIGH-RESOLUTION RESIST MASK
Authors: KRAGLER K GUNTHER E LEUSCHNER R FALK G HAMMERSCHMIDT A VONSEGGEM H SAEMANNISCHENKO G
Citation: K. Kragler et al., SCANNING-TUNNELING-MICROSCOPY BASED LITHOGRAPHY EMPLOYING AMORPHOUS HYDROGENATED CARBON AS A HIGH-RESOLUTION RESIST MASK, Applied physics letters, 67(8), 1995, pp. 1163-1165
INFLUENCE OF 30 MEV S-32 IRRADIATION ON THE ELECTRONIC STATES OF LN2-XCEXCUO4-DELTA CUPRATES
Authors: KRAGLER K KLAUDA M FINK C
Citation: K. Kragler et al., INFLUENCE OF 30 MEV S-32 IRRADIATION ON THE ELECTRONIC STATES OF LN2-XCEXCUO4-DELTA CUPRATES, Physica. C, Superconductivity, 226(1-2), 1994, pp. 125-132
Risultati: 1-9 |