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Results: 1-25/27
Authors:
ACKERMANN L
KULISCH W
Citation: L. Ackermann et W. Kulisch, A NEW EXPERIMENTAL SETUP FOR IN-SITU CHARACTERIZATION OF DIAMOND DEPOSITION BY SCANNING-TUNNELING-MICROSCOPY, Applied physics A: Materials science & processing, 66, 1998, pp. 45-48
Authors:
MIHALCEA C
SCHOLZ W
MALAVE A
ALBERT D
KULISCH W
OESTERSCHULZE E
Citation: C. Mihalcea et al., FABRICATION OF MONOLITHIC DIAMOND PROBES FOR SCANNING PROBE MICROSCOPY APPLICATIONS, Applied physics A: Materials science & processing, 66, 1998, pp. 87-90
Authors:
SCHILLER M
KULISCH W
Citation: M. Schiller et W. Kulisch, PLASMA PROPERTIES AT THE TRANSITION FROM REMOTE TO DIRECT PLASMA, Surface & coatings technology, 98(1-3), 1998, pp. 1590-1599
Authors:
KUSCHNEREIT R
HESS P
ALBERT D
KULISCH W
Citation: R. Kuschnereit et al., DENSITY AND ELASTIC-CONSTANTS OF HOT-FILAMENT-DEPOSITED POLYCRYSTALLINE DIAMOND FILMS - METHANE CONCENTRATION-DEPENDENCE, Thin solid films, 312(1-2), 1998, pp. 66-72
Authors:
FREUDENSTEIN R
REINKE S
KULISCH W
Citation: R. Freudenstein et al., INVESTIGATION OF THE NUCLEATION LAYER IN C-BN FILM GROWTH, DIAMOND AND RELATED MATERIALS, 6(5-7), 1997, pp. 584-588
Authors:
KULISCH W
MALAVE A
LIPPOLD G
SCHOLZ W
MIHALCEA C
OESTERSCHULZE E
Citation: W. Kulisch et al., FABRICATION OF INTEGRATED DIAMOND CANTILEVERS WITH TIPS FOR SPM APPLICATIONS, DIAMOND AND RELATED MATERIALS, 6(5-7), 1997, pp. 906-911
Authors:
KULISCH W
REINKE S
Citation: W. Kulisch et S. Reinke, MODELING OF C-BN THIN-FILM DEPOSITION, Diamond films and technology, 7(2), 1997, pp. 105-138
Authors:
REINKE S
KULISCH W
Citation: S. Reinke et W. Kulisch, MECHANISMS IN ION-ASSISTED DEPOSITION OF SUPERHARD COATINGS - CUBIC BORON-NITRIDE TETRAHEDRAL AMORPHOUS-CARBON, Surface & coatings technology, 97(1-3), 1997, pp. 23-32
Authors:
REINKE S
FREUDENSTEIN R
KULISCH W
Citation: S. Reinke et al., ON THE ROLE OF ION-BOMBARDMENT IN CUBIC BORON-NITRIDE DEPOSITION, Surface & coatings technology, 97(1-3), 1997, pp. 263-269
Authors:
FREUDENSTEIN R
REINKE S
KULISCH W
Citation: R. Freudenstein et al., THE INFLUENCE OF HYDROGEN ON NUCLEATION AND GROWTH OF CUBIC BORON-NITRIDE FILMS, Surface & coatings technology, 97(1-3), 1997, pp. 270-274
Authors:
OESTERSCHULZE E
SCHOLZ W
MIHALCEA C
ALBERT D
SOBISCH B
KULISCH W
Citation: E. Oesterschulze et al., FABRICATION OF SMALL DIAMOND TIPS FOR SCANNING PROBE MICROSCOPY APPLICATION, Applied physics letters, 70(4), 1997, pp. 435-437
Authors:
KUHR M
FREUDENSTEIN R
REINKE S
KULISCH W
DOLLINGER G
BERGMAIER A
Citation: M. Kuhr et al., HYDROGEN INCORPORATION DURING NUCLEATION AND GROWTH OF C-BN FILMS, DIAMOND AND RELATED MATERIALS, 5(9), 1996, pp. 984-989
Authors:
JANSEN E
DORSCH O
OBERMEIER E
KULISCH W
Citation: E. Jansen et al., THERMAL-CONDUCTIVITY MEASUREMENTS ON DIAMOND FILMS BASED ON MICROMECHANICAL DEVICES, DIAMOND AND RELATED MATERIALS, 5(6-8), 1996, pp. 644-648
Authors:
REINKE S
KUHR M
KULISCH W
Citation: S. Reinke et al., INVESTIGATION OF STRESS AND ADHESION OF CUBIC BORON-NITRIDE FILMS, DIAMOND AND RELATED MATERIALS, 5(3-5), 1996, pp. 508-513
Authors:
WILSON JIB
KULISCH W
Citation: Jib. Wilson et W. Kulisch, SPECIAL ISSUE ON DIAMOND THIN-FILMS - PREFACE, Physica status solidi. a, Applied research, 154(1), 1996, pp. 3-3
Authors:
KULISCH W
ACKERMANN L
SOBISCH B
Citation: W. Kulisch et al., ON THE MECHANISMS OF BIAS ENHANCED NUCLEATION OF DIAMOND, Physica status solidi. a, Applied research, 154(1), 1996, pp. 155-174
Authors:
BECKMANN R
SOBISCH B
KULISCH W
Citation: R. Beckmann et al., ON THE GAS-PHASE MECHANISMS IN MWCVD AND HFCVD DIAMOND DEPOSITION, DIAMOND AND RELATED MATERIALS, 4(4), 1995, pp. 256-260
Authors:
REINKE S
KUHR M
KULISCH W
KASSING R
Citation: S. Reinke et al., RECENT RESULTS IN CUBIC BORON-NITRIDE DEPOSITION IN LIGHT OF THE SPUTTER MODEL, DIAMOND AND RELATED MATERIALS, 4(4), 1995, pp. 272-283
Authors:
KUHR M
REINKE S
KULISCH W
Citation: M. Kuhr et al., NUCLEATION OF CUBIC BORON-NITRIDE (C-BN) WITH ION-INDUCED PLASMA-ENHANCED CVD, DIAMOND AND RELATED MATERIALS, 4(4), 1995, pp. 375-380
Authors:
KULISCH W
SOBISCH B
KUHR M
BECKMANN R
Citation: W. Kulisch et al., CHARACTERIZATION OF THE BIAS NUCLEATION PROCESS, DIAMOND AND RELATED MATERIALS, 4(4), 1995, pp. 401-405
Authors:
KULISCH W
SCHILLER M
REINKE S
Citation: W. Kulisch et al., IN-SITU CHARACTERIZATION OF THE REMOTE PLASMA TECHNIQUE, Surface & coatings technology, 74-5(1-3), 1995, pp. 455-460
Authors:
REINKE S
KUHR M
KULISCH W
Citation: S. Reinke et al., MECHANISMS IN ION-INDUCED C-BN GROWTH, DIAMOND AND RELATED MATERIALS, 3(4-6), 1994, pp. 341-345
Authors:
BECKMANN R
SOBISCH B
KULISCH W
RAU C
Citation: R. Beckmann et al., INVESTIGATION OF THE BIAS NUCLEATION PROCESS IN MICROWAVE PLASMA-ENHANCED CHEMICAL-VAPOR-DEPOSITION OF DIAMOND, DIAMOND AND RELATED MATERIALS, 3(4-6), 1994, pp. 555-559
Authors:
RAU C
KULISCH W
Citation: C. Rau et W. Kulisch, MECHANISMS OF PLASMA POLYMERIZATION OF VARIOUS SILICO-ORGANIC MONOMERS, Thin solid films, 249(1), 1994, pp. 28-37
Authors:
DAHLHAUS J
JUTZI P
FRENCK HJ
KULISCH W
Citation: J. Dahlhaus et al., (ME5C5)SIH3 AND (ME5C5)2SIH2 AS PRECURSORS FOR LOW-TEMPERATURE REMOTEPLASMA-ENHANCED CVD OF THIN SI3N4 AND SIO2-FILMS, Advanced materials, 5(5), 1993, pp. 377-380