Authors:
Klopf, F
Krebs, R
Reithmaier, JP
Forchel, A
Citation: F. Klopf et al., High-temperature operating 1.3-mu m quantum-dot lasers for telecommunication applications, IEEE PHOTON, 13(8), 2001, pp. 764-766
Authors:
Avary, K
Rennon, S
Klopf, F
Reithmaier, JP
Forchel, A
Citation: K. Avary et al., Reactive ion etching of deeply etched DBR-structures with reduced air-gapsfor-highly reflective monolithically integrated laser mirrors, MICROEL ENG, 57-8, 2001, pp. 593-598
Authors:
Moosburger, J
Kamp, M
Klopf, F
Fischer, M
Forchel, A
Citation: J. Moosburger et al., Fabrication of semiconductor lasers with 2D-photonic crystal mirrors usinga wet oxidized Al2O3-mask, MICROEL ENG, 57-8, 2001, pp. 1017-1021
Citation: F. Klopf et al., Low threshold high efficiency MBE grown GaInAs/(Al)GaAs quantum dot lasersemitting at 980 nm, J CRYST GR, 227, 2001, pp. 1151-1154
Authors:
Krebs, R
Klopf, F
Rennon, S
Reithmaier, JP
Forchel, A
Citation: R. Krebs et al., High frequency characteristics of InAs/GaInAs quantum dot distributed feedback lasers emitting at 1.3 mu m, ELECTR LETT, 37(20), 2001, pp. 1223-1225
Citation: F. Klopf et al., Highly efficient GaInAs/(Al)GaAs quantum-dot lasers based on a single active layer versus 980 nm high-power quantum-well lasers, APPL PHYS L, 77(10), 2000, pp. 1419-1421