Authors:
Koester, SJ
Rim, K
Chu, JO
Mooney, PM
Ott, JA
Hargrove, MA
Citation: Sj. Koester et al., Effect of thermal processing on strain relaxation and interdiffusion in Si/SiGe heterostructures studied using Raman spectroscopy, APPL PHYS L, 79(14), 2001, pp. 2148-2150
Citation: Lj. Huang et al., SiGe-on-insulator prepared by wafer bonding and layer transfer for high-performance field-effect transistors, APPL PHYS L, 78(9), 2001, pp. 1267-1269
Authors:
Lu, W
Koester, SJ
Wang, XW
Chu, JO
Ma, TP
Adesida, I
Citation: W. Lu et al., Comparative study of self-aligned and nonself-aligned SiGe p-metal-oxide-semiconductor modulation-doped field effect transistors with nanometer gate lengths, J VAC SCI B, 18(6), 2000, pp. 3488-3492