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Authors:
Kim, JS
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Kwon, KH
Citation: Js. Kim et al., Characterization of an oxygen plasma by using a Langmuir probe in an inductively coupled plasma, J KOR PHYS, 38(3), 2001, pp. 259-263
Citation: Sb. Damelin et al., Convergence of Hermite and Hermite-Fejer interpolation of higher order forFreud weights, J APPROX TH, 113(1), 2001, pp. 21-58
Authors:
Kang, SY
Kwon, KH
Kim, SI
Lee, SK
Jung, MY
Cho, YR
Song, YH
Lee, JH
Cho, KI
Citation: Sy. Kang et al., Etch characteristics of Cr by using Cl-2/O-2 gas mixtures with electron cyclotron resonance plasma, J ELCHEM SO, 148(5), 2001, pp. G237-G240
Citation: Kh. Kwon et al., Orthogonal polynomial eigenfunctions of second-order partial differerential equations, T AM MATH S, 353(9), 2001, pp. 3629-3647
Authors:
Park, JY
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Citation: Jy. Park et al., A study on the etch characteristics of ITO thin film using inductively coupled plasmas, SURF COAT, 131(1-3), 2000, pp. 247-251
Authors:
Lee, GS
Kim, J
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Kim, BC
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Kim, JY
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Kim, YS
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Song, KY
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Hong, G
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Kim, YJ
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Citation: Gs. Lee et al., The KSTAR project: An advanced steady state superconducting tokamak experiment, NUCL FUSION, 40(3Y), 2000, pp. 575-582
Authors:
Park, HC
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Citation: Hc. Park et al., Open-label, uncontrolled, clinical trial of barnidipine hydrochloride in Korean patients with renal parenchymal hypertension, CURR THER R, 61(12), 2000, pp. 927-937
Authors:
Baek, KH
Yoon, YS
Park, JM
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Kim, CI
Nam, KS
Citation: Kh. Baek et al., Corrosion at the grain boundary and a fluorine-related passivation layer on etched Al-Cu (1%) alloy surfaces, ETRI J, 21(3), 1999, pp. 16-21
Citation: B. Kim et al., Characterizing metal-masked silica etch process in a CHF3/CF4 inductively coupled plasma, J VAC SCI A, 17(5), 1999, pp. 2593-2597
Authors:
Kim, JM
Song, YG
Oho, YC
Park, HC
Kwon, KH
Kim, E
Lee, SH
Kim, KH
Citation: Jm. Kim et al., Antibodies to human T-cell lymphotropic virus type I (HTLV-I) by particle agglutination (PA) test in Korean blood donors, YONSEI MED, 40(2), 1999, pp. 173-177
Citation: Nh. Kim et al., A study on the suppression of etch residues by O-2 gas addition in dry etching of Pt film, J KOR PHYS, 35, 1999, pp. S806-S809
Authors:
Yoon, YS
Baek, KH
Park, JM
Kwon, KH
Kim, CI
Hwang, IG
Citation: Ys. Yoon et al., Angle-resolved XPS investigation of the fluorine-related passivation layeron etched Al (Cu 1%) surface after SF6 treatment, J KOR PHYS, 34, 1999, pp. S305-S309