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Results: 1-13 |
Results: 13

Authors: LANDHEER D SAYEDI SM LANDSBERGER LM KAHRIZI M
Citation: D. Landheer et al., FOURIER-TRANSFORM INFRARED-SPECTROSCOPY OF CORONA-PROCESSED SILICON DIOXIDE FILMS, Journal of vacuum science & technology. B, Microelectronics and nanometer structures processing, measurement and phenomena, 16(2), 1998, pp. 605-608

Authors: NIKPOUR B LANDSBERGER LM HUBBARD TJ KAHRIZI M IFTIMIE A
Citation: B. Nikpour et al., CONCAVE CORNER COMPENSATION BETWEEN VERTICAL (010)-(001)PLANES ANISOTROPICALLY ETCHED IN SI(100), Sensors and actuators. A, Physical, 66(1-3), 1998, pp. 299-307

Authors: PANDY A LANDSBERGER LM NIKPOUR B PARANJAPE M KAHRIZI M
Citation: A. Pandy et al., EXPERIMENTAL INVESTIGATION OF HIGH SI AL SELECTIVITY DURING ANISOTROPIC ETCHING IN TETRA-METHYL AMMONIUM HYDROXIDE/, Journal of vacuum science & technology. A. Vacuum, surfaces, and films, 16(2), 1998, pp. 868-872

Authors: SAYEDI SM LANDSBERGER LM KAHRIZI M BELKOUCH S LANDHEER D
Citation: Sm. Sayedi et al., ELECTRICAL CHARACTERIZATION OF THIN SIO2-FILMS ON SILICON CREATED BY ANODIC OXYGEN CORONA DISCHARGE PROCESSING, Journal of the Electrochemical Society, 145(8), 1998, pp. 2937-2943

Authors: SAYEDI SM LANDHEER D LANDSBERGER LM KAHRIZI M
Citation: Sm. Sayedi et al., MECHANISMS OF FILM GROWTH-RATE ENHANCEMENT IN ANODIC AND CATHODIC CORONA-DISCHARGE OXIATION PROCESSES, Journal of the Electrochemical Society, 145(8), 1998, pp. 2944-2950

Authors: BELKOUCH S NGUYEN TK LANDSBERGER LM AKTIK C JEAN C KAHRIZI M
Citation: S. Belkouch et al., INTERFACE STATES DISTRIBUTION IN ELECTRICAL STRESSED OXYNITRIDED GATE-OXIDE, Journal of the Electrochemical Society, 145(7), 1998, pp. 2489-2493

Authors: AHMAD H ALKHALILI AJ LANDSBERGER LM KAHRIZI M
Citation: H. Ahmad et al., A 2-DIMENSIONAL MICROMACHINED ACCELEROMETER, IEEE transactions on instrumentation and measurement, 46(1), 1997, pp. 18-26

Authors: NGUYEN TK LANDSBERGER LM JEAN C LOGIUDICE V
Citation: Tk. Nguyen et al., EFFECTS OF FLUORINE IMPLANTS ON INDUCED CHARGE COMPONENTS IN GATE-OXIDES UNDER CONSTANT-CURRENT FOWLER-NORDHEIM STRESS, I.E.E.E. transactions on electron devices, 44(9), 1997, pp. 1432-1440

Authors: NGUYEN TK LANDSBERGER LM BELKOUCH S JEAN C
Citation: Tk. Nguyen et al., ELECTRICAL CHARACTERIZATION OF OXYNITRIDED GATE DIELECTRICS UNDER CONSTANT-CURRENT FOWLER-NORDHEIM STRESS, Journal of the Electrochemical Society, 144(9), 1997, pp. 3299-3304

Authors: LANDSBERGER LM NASEH S KAHRIZI M PARANJAPE M
Citation: Lm. Landsberger et al., ON HILLOCKS GENERATED DURING ANISOTROPIC ETCHING OF SI IN TMAH, Journal of microelectromechanical systems, 5(2), 1996, pp. 106-116

Authors: PARANJAPE M LANDSBERGER LM KAHRIZI M
Citation: M. Paranjape et al., A CMOS-COMPATIBLE 2-D VERTICAL HALL MAGNETIC-FIELD SENSOR USING ACTIVE CARRIER CONFINEMENT AND POST-PROCESS MICROMACHINING, Sensors and actuators. A, Physical, 53(1-3), 1996, pp. 278-283

Authors: NGUYEN TK LANDSBERGER LM LOGIUDICE V JEAN C
Citation: Tk. Nguyen et al., ELECTRICAL CHARACTERIZATION OF FLUORINE-IMPLANTED GATE OXIDE STRUCTURES, Canadian journal of physics, 74, 1996, pp. 74-78

Authors: NASEH S LANDSBERGER LM PARANJAPE M KAHRIZI A
Citation: S. Naseh et al., EXPERIMENTAL INVESTIGATIONS OF ANISOTROPIC ETCHING OF SI IN TETRAMETHYL AMMONIUM HYDROXIDE, Canadian journal of physics, 74, 1996, pp. 79-84
Risultati: 1-13 |